Spectroscopic ellipsometry study of InGaAs alloy films grown on InP

被引:0
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作者
Seong, GY [1 ]
Bang, CY
Kim, YD
Wang, J
Aspnes, DE
Koo, BH
Yao, T
机构
[1] Kyung Hee Univ, Dept Phys, Seoul 130701, South Korea
[2] Kyung Hee Univ, Res Inst Basic Sci, Seoul 130701, South Korea
[3] N Carolina State Univ, Dept Phys, Raleigh, NC 27606 USA
[4] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
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中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We report pseudodielectric functions < epsilon > of InxGa1-xAs alloy films for In compositions x of 0 less than or equal to x less than or equal to0.66. Films were grown on (110) InP substrates by a solid-source molecular beam epitaxy. We used chemical etching to obtain the best approximation to the bulk pure dielectric responses epsilon of the films by removingg overlayers. We obtain the dependences of the E-1 and E-1 + Delta (1) band gaps with x, and estimated bowing parameters by fitting critical point structures in second energy derivatives of the < epsilon > spectra.
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页码:S389 / S392
页数:4
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