Carbon nanofiber growth in plasma-enhanced chemical vapor deposition

被引:26
|
作者
Denysenko, I. [1 ,2 ]
Ostrikov, K. [1 ,3 ,4 ]
Cvelbar, U. [4 ]
Mozetic, M. [4 ]
Azarenkov, N. A. [2 ]
机构
[1] Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia
[2] Kharkov Natl Univ, Sch Phys & Technol, UA-61077 Kharkov, Ukraine
[3] CSIRO Mat Sci & Engn, Lindfield, NSW 2070, Australia
[4] Jozef Stefan Inst, SI-1000 Ljubljana, Slovenia
基金
澳大利亚研究理事会;
关键词
D O I
10.1063/1.2986915
中图分类号
O59 [应用物理学];
学科分类号
摘要
A theoretical model to describe the plasma-assisted growth of carbon nanofibers (CNFs) is proposed. Using the model, the plasma-related effects on the nanofiber growth parameters, such as the growth rate due to surface and bulk diffusion, the effective carbon flux to the catalyst surface, the characteristic residence time and diffusion length of carbon atoms on the catalyst surface, and the surface coverages, have been studied. The dependence of these parameters on the catalyst surface temperature and ion and etching gas fluxes to the catalyst surface is quantified. The optimum conditions under which a low-temperature plasma environment can benefit the CNF growth are formulated. These results are in good agreement with the available experimental data on CNF growth and can be used for optimizing synthesis of related nanoassemblies in low-temperature plasma-assisted nanofabrication. (C) 2008 American Institute of Physics. [DOI: 10.1063/1.2986915]
引用
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页数:9
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