Contamination experiments for Mo/Si multilayer mirrors with the use of single-bunch synchrotron radiation

被引：1
|
作者：
Niibe, Masahito [1 ]
Koida, Keigo [1 ]
Kakutani, Yukinobu [1 ]
机构：
[1] Univ Hyogo, Lab Adv Sci & Technol Ind, Kamigori, Hyogo 6781205, Japan
来源：
11TH INTERNATIONAL CONFERENCE ON SYNCHROTRON RADIATION INSTRUMENTATION (SRI 2012) | 2013年 / 425卷
关键词：
LITHOGRAPHY PROJECTION OPTICS; SURFACE OXIDATION; EXTREME; PERFORMANCE;
D O I：
10.1088/1742-6596/425/13/132021
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
An extreme ultraviolet (EUV) irradiation experiment with the use of single-bunch synchrotron radiation (SR) was carried out to evaluate the optics lifetime for EUV lithography due to contaminations. The sequential change in the reflectivity of Ru-capped Mo/Si multilayer mirrors was measured during EUV irradiation in the presence of hydrocarbon gas or water vapor vacuum environment. The EUV dose dependence of decreases in reflectivity for single-bunch SR was almost the same as that for light-attenuated multibunch SR. From the results, there was no marked difference in the dependence of decrease in reflectivity on pulse structure in the frequency range of 2.5 to 500 MHz.
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页数：4
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