Multi-technique study of carbon contamination and cleaning of Mo/Si mirrors exposed to pulsed EUV radiation

被引：4
|
作者：
Schuermann, Mark [1 ]
Yulin, Sergiy [1 ]
Nesterenko, Viatcheslav [1 ]
Feigl, Torsten [1 ]
Kaiser, Norbert [1 ]
Tkachenko, Boris [2 ]
Schuermann, Max C. [2 ]
机构：
[1] Fraunhofer IOF, Albert Einstein Str 7, D-07745 Jena, Germany
[2] XTREME Technol Gmbh, D-37077 Gottingen, Germany
来源：
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY | 2010年 / 7636卷
关键词：
EUVL; multilayer optics; optics lifetime; carbon growth; in-situ cleaning;
D O I：
10.1117/12.848197
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Comparative lifetime studies of Mo/Si multilayer mirrors have been conducted at the Exposure Test Stand (ETS) using a pulsed Xe-discharge EUV source at XTREME Technologies GmbH (Gottingen, Germany). Due to the large, homogeneous exposed sample area a multi-technique study of EUV induced carbon contamination and cleaning can be conducted using standard surface science techniques. EUV-reflectometry, X-ray photoelectron spectroscopy (XPS), small-angle X-ray reflectometry (SAXR), and Out-of-band (OOB) reflectometry (200 - 1000 nm) were applied to investigate exposed samples and study EUV-induced changes of the surface composition. With this approach the influence of EUV-dose, cleaning-gas pressure and composition, and capping-layer material of the Mo/Si multilayer samples on the degradation and cleaning mechanism can be studied.
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页数：9
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