Deposition of Polyacrylic Acid Films by Means of an Atmospheric Pressure Dielectric Barrier Discharge

被引:43
|
作者
Morent, Rino [1 ]
De Geyter, Nathalie [1 ]
Van Vlierberghe, Sandra [2 ]
Vanderleyden, Els [2 ]
Dubruel, Peter [2 ]
Leys, Christophe [1 ]
Schacht, Etienne [2 ]
机构
[1] Univ Ghent, Dept Appl Phys, Res Unit Plasma Technol, Fac Engn, B-9000 Ghent, Belgium
[2] Univ Ghent, Dept Organ Chem, Fac Sci, Polymer Chem & Biomat Res Grp, B-9000 Ghent, Belgium
关键词
Plasma polymerisation; Acrylic acid; Dielectric barrier discharge; Atmospheric pressure; CHEMICAL-VAPOR-DEPOSITION; PLASMA-POLYMERIZED FILMS; ACRYLIC-ACID; SURFACE-TREATMENT; GLOW-DISCHARGE; THIN-FILMS; HELIUM; FREQUENCY; COATINGS; NITROGEN;
D O I
10.1007/s11090-009-9167-1
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
The present work describes the plasma polymerisation of acrylic acid at atmospheric pressure. The influence of two operating parameters (monomer concentration and discharge power) on the properties of the deposited films is investigated. Results show that at a monomer concentration of 2.5 ppm and a discharge power of 9.5 W, the monomer is only slightly fragmented leading to a high amount of carboxylic acid groups on the deposited films. In contrast, when monomer concentration is decreased or discharge power increased, the incidence of monomer fragmentation processes is higher, leading to a lower amount of carboxylic acid groups on the films. This behaviour can be explained by a higher energy amount available per monomer molecule at low monomer concentrations and high discharge powers and a higher flux of positive ions attacking the surface at high discharge powers. Taking into account these results, it can be concluded that the deposition parameters should be carefully selected in order to preserve the stability of the monomer and thus obtain coatings with high carboxylic acid densities.
引用
收藏
页码:103 / 117
页数:15
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