Estimation of the Activation Energy of Resist Removal Using Wet Ozone

被引:2
|
作者
Goto, Yousuke [1 ]
Funasaka, Tomohiro [1 ]
Yamamoto, Masashi [1 ]
Koike, Kunihiko [2 ]
Horibe, Hideo [1 ]
机构
[1] Kanazawa Inst Technol, Haku San 9240838, Japan
[2] Iwatani Corp, Iwatani R&D Ctr, Amagasaki, Hyogo 6610965, Japan
关键词
Resist Removal; Wet Ozone; Ozonide; Hydrolysis; Activation Energy; PLASMA; PHOTORESIST; VAPOR; GAS; CONTAMINATION; TEMPERATURE;
D O I
10.1295/koron.70.295
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Using environmentally friendly wet ozone instead of conventional chemicals, we removed positive-tone novolak resists. In the wet ozone process, resists are decomposed and removed through ozonolysis of the resists and the hydrolysis of the ozonolysis products. It was revealed that the temperature difference (= "wet ozone temperature" - "substrate temperature"), to control water requirements for the hydrolysis strongly influences the resist removal rate. The activation energy of the removal reaction of this process was estimated to be 28.0 kJ/mol. The activation energy is 10 similar to 20 kJ/mol lower than that of the commonly-used ashing process, therefore the resist can be removed at a higher rate and at a lower temperature.
引用
收藏
页码:295 / 299
页数:5
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