Ion Angular Distribution in Vacuum Arc Plasma

被引：0

作者：

Nikolaev, A. G. ^{[1
]}

Yushkov, G. Yu ^{[1
]}

Savkin, K. P. ^{[1
]}

Oks, E. M. ^{[1
]}

机构：

[1] Russian Acad Sci, Siberian Branch, Inst High Current Elect, Tomsk 634055, Russia

来源：

25TH INTERNATIONAL SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM (ISDEIV 2012) | 2012年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The angular distribution of the metal and gaseous ion flow from vacuum arc plasma has been investigated. A Mevva-type ion source and a Time-of-Flight (TOF) mass-spectrometer were used. The experiments were performed using a range of different cathode materials, including C, Al, Zn, Cu, Ti, Co, Cr, W, Pb, Cu0.7Cr0.3, W0.4Co0.17C0.43, and Zn0.4Pb0.6, over a range of vacuum arc discharge parameters. Variable parameters in this study were vacuum arc discharge current, background gas pressure, configuration of cathode-anode gap, and composition of cathode material. A comparison with results obtained by other authors was made. The influence of discharge parameters on the ion angular distribution in a vacuum arc source is discussed.

引用

页码：372 / 375

页数：4

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