Ion Angular Distribution in Vacuum Arc Plasma

被引：0
|
作者：
Nikolaev, A. G. [1 ]
Yushkov, G. Yu [1 ]
Savkin, K. P. [1 ]
Oks, E. M. [1 ]
机构：
[1] Russian Acad Sci, Siberian Branch, Inst High Current Elect, Tomsk 634055, Russia
来源：
25TH INTERNATIONAL SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM (ISDEIV 2012) | 2012年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The angular distribution of the metal and gaseous ion flow from vacuum arc plasma has been investigated. A Mevva-type ion source and a Time-of-Flight (TOF) mass-spectrometer were used. The experiments were performed using a range of different cathode materials, including C, Al, Zn, Cu, Ti, Co, Cr, W, Pb, Cu0.7Cr0.3, W0.4Co0.17C0.43, and Zn0.4Pb0.6, over a range of vacuum arc discharge parameters. Variable parameters in this study were vacuum arc discharge current, background gas pressure, configuration of cathode-anode gap, and composition of cathode material. A comparison with results obtained by other authors was made. The influence of discharge parameters on the ion angular distribution in a vacuum arc source is discussed.
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页码：372 / 375
页数：4
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