The study of ion mixed amorphous carbon films on single crystal silicon by C ion implantation

被引：1
|
作者：
Sun, Rong
Xu, Tao
Zhang, Jing-wei
Xue, Qun-ji [1 ]
机构：
[1] Chinese Acad Sci, State Key Lab Solid Lubricat, Lanzhou Chem Phys, Lanzhou 730000, Peoples R China
[2] Henan Univ, Lab Sepcial Funct Mat, Kaifeng 475001, Peoples R China
[3] Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China
来源：
APPLIED SURFACE SCIENCE | 2006年 / 252卷 / 12期
基金：
中国国家自然科学基金;
关键词：
amorphous carbon film; C+ implantation; single-crystal silicon; friction and wear;
D O I：
10.1016/j.apsusc.2005.06.037
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Amorphous-carbon (a-C) films were deposited on a single-crystal silicon substrate by vacuum vapor deposition system and these amorphous carbon films were implanted with 110 keV C+ at fluences of 1 x 10(17) ions/cm(2). The effect of ion mixing on the surface morphology, friction behavior and adhesion strengths of amorphous carbon films was examined making use of atomic force microscopy (AFM), ball-on-disk reciprocating friction tester, nano-indentation system and scanning electron microscope (SEM). The changes in chemical composition and structure were investigated by using X-ray photoelectron spectroscopy (XPS). The results show that the anti-wear life and adhesion of amorphous carbon films on the Si substrates were significantly increased by C ion implantation. The Si-C chemical bonding across the interface plays a key role in the increase of adhesion strength and the anti-wear life of amorphous carbon film. The friction and wear mechanisms of amorphous carbon film under dry friction condition were also discussed. (c) 2005 Elsevier B.V All rights reserved.
引用
收藏
页码：4236 / 4243
页数：8
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