Dynamics of a pulsed inductively coupled oxygen plasma

被引:7
|
作者
Zaka-ul-Islam, Mujahid [1 ,2 ]
机构
[1] Jazan Univ, Dept Phys, Fac Sci, Jazan 45142, Saudi Arabia
[2] Queens Univ Belfast, Sch Math & Phys, Ctr Plasma Phys, Belfast BT7 1NN, Antrim, North Ireland
关键词
H-MODE TRANSITION;
D O I
10.1063/1.4967769
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Inductively coupled plasma system (ICPs) is extensively used for a wide range of nanofabrication applications. The ICPs operated in a pulsed or power modulated mode has shown several advantages compared to the continuous discharge. In this work, the plasma dynamics in a planar coil pulsed inductively coupled plasma system (ICPs) operated in oxygen has been investigated, using phase and space resolved optical emission spectroscopy. It is well-known that the ICPs operates in two distinct operational modes as a function of power known as E and H modes, generated dominantly by capacitive and inductive couplings, respectively. The measurements show that the discharge ignites due a capacitive coupling (in the E-mode) and later transits to the H-mode as a function of time. The inductive coupling, however, starts during the E-mode along with capacitive coupling. The relative contribution of inductive coupling increases until the discharge reaches the E-H transition where the growth rate of inductive coupling becomes much faster. It is found that the time to reach E-H transition decreases with the pressure. At the E-H transition, the total emission has a spike-like feature (i. e., it first achieves a peak emission which later decreases and finally settles to a lower value). The 2D images of the discharge show that at the time of peak totalemission, the discharge structure is sharp and bright, which later decreases in brightness and becomes diffusive. Published by AIP Publishing.
引用
收藏
页数:6
相关论文
共 50 条
  • [21] LONG-TERM INTENSITY OSCILLATIONS IN A PULSED INDUCTIVELY COUPLED PLASMA
    MILLER, GP
    SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1992, 47 (08) : 1013 - 1022
  • [22] Characterization of stationary and pulsed inductively coupled RF discharges for plasma sterilization
    Gans, T
    Osiac, M
    O'Connell, D
    Kadetov, VA
    Czarnetzki, U
    Schwarz-Selinger, T
    Halfmann, H
    Awakowicz, P
    PLASMA PHYSICS AND CONTROLLED FUSION, 2005, 47 : A353 - A360
  • [23] E-H Transition in a Pulsed Inductively Coupled Argon Plasma
    Zaka-ul-Islam, Mujahid
    Proceedings of the Fifth Saudi International Meeting on Frontiers of Physics (SIMFP2016), 2016, 1742
  • [24] Experimental study of diffusive cooling of electrons in a pulsed inductively coupled plasma
    Maresca, A
    Orlov, K
    Kortshagen, U
    PHYSICAL REVIEW E, 2002, 65 (05):
  • [25] Fluid simulation of a pulsed-power inductively coupled argon plasma
    Lymberopoulos, D.P.
    Kolobov, V.I.
    Economou, D.J.
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1998, 16 (02):
  • [26] A study on the oxidation kinetics of silicon in inductively coupled oxygen plasma
    Choi, YW
    Ahn, BT
    JOURNAL OF APPLIED PHYSICS, 1999, 86 (07) : 4004 - 4007
  • [27] SU-8 etching in inductively coupled oxygen plasma
    Rasmussen, Kristian Hagsted
    Keller, Stephan Sylvest
    Jensen, Flemming
    Jorgensen, Anders Michael
    Hansen, Ole
    MICROELECTRONIC ENGINEERING, 2013, 112 : 35 - 40
  • [28] ATOMIC OXYGEN SPECTRA IN THE ARGON INDUCTIVELY COUPLED PLASMA (ICP)
    NORTHWAY, SJ
    FRY, RC
    APPLIED SPECTROSCOPY, 1980, 34 (03) : 332 - 338
  • [29] Reduction of plasma induced damage in an inductively coupled plasma using pulsed source power
    Samukawa, S
    Noguchi, K
    Colonell, JI
    Bogart, KHA
    Malyshev, MV
    Donnelly, VM
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (02): : 834 - 840
  • [30] Plasma dynamics in an inductively coupled magnetic neutral loop discharge
    O'Connell, D.
    Gans, T.
    Crintea, D. L.
    Czarnetzki, U.
    Sadeghi, N.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2008, 17 (02):