Characterization of stationary and pulsed inductively coupled RF discharges for plasma sterilization

被引:27
|
作者
Gans, T [1 ]
Osiac, M
O'Connell, D
Kadetov, VA
Czarnetzki, U
Schwarz-Selinger, T
Halfmann, H
Awakowicz, P
机构
[1] Ruhr Univ Bochum, Inst Plasma & Atom Phys, CPST, D-44780 Bochum, Germany
[2] Max Planck Inst Plasma Phys, Ctr Interdisciplinary Plasma Sci, D-85748 Garching, Germany
[3] Ruhr Univ Bochum, Inst Elect Engn & Plasma Technol, CPST, D-44780 Bochum, Germany
关键词
D O I
10.1088/0741-3335/47/5A/026
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Sterilization of bio-medical materials using radio frequency (RF) excited inductively coupled plasmas (ICPs) has been investigated. A double ICP has been developed and studied for homogenous treatment of three-dimensional objects. Sterilization is achieved through a combination of ultraviolet light, ion bombardment and radical treatment. For temperature sensitive materials, the process temperature is a crucial parameter. Pulsing of the plasma reduces the time average heat strain and also provides additional control of the various sterilization mechanisms. Certain aspects of pulsed plasmas are, however, not yet fully understood. Phase resolved optical emission spectroscopy and time resolved ion energy analysis illustrate that a pulsed ICP ignites capacitively before reaching a stable inductive mode. Time resolved investigations of the post-discharge, after switching off the RF power, show that the plasma boundary sheath in front of a substrate does not fully collapse for the case of hydrogen discharges. This is explained by electron heating through super-elastic collisions with vibrationally excited hydrogen molecules.
引用
收藏
页码:A353 / A360
页数:8
相关论文
共 50 条
  • [1] Plasma boundary sheath in the afterglow of a pulsed inductively coupled RF plasma
    Osiac, M.
    Schwarz-Selinger, T.
    O'Connell, D.
    Heil, B.
    Petrovic, Z. Lj
    Turner, M. M.
    Gans, T.
    Czarnetzki, U.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2007, 16 (02): : 355 - 363
  • [2] SPECTROSCOPIC CHARACTERIZATION OF FILMS OBTAINED IN PULSED RF PLASMA DISCHARGES
    SAVAGE, CR
    TIMMONS, RB
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1991, 201 : 53 - PMSE
  • [3] Measurements of time resolved rf impedance of a pulsed inductively coupled Ar plasma
    Chang, Chia-Hao
    Leou, Keh-Chyang
    Chen, Chin-Hsiung
    Lin, Chaung
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2006, 15 (03): : 338 - 344
  • [4] Inductively coupled RF oxygen plasma characterization by optical emission spectroscopy
    Cvelbar, Uros
    Krstulovic, Niksa
    Milosevic, Slobodan
    Mozetic, Miran
    VACUUM, 2007, 82 (02) : 224 - 227
  • [5] Plasma sterilization of Geobacillus Stearothermophilus by O2:N2 RF inductively coupled plasma
    Kylian, O.
    Sasaki, T.
    Rossi, F.
    EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2006, 34 (02): : 139 - 142
  • [6] Time-resolved current and voltage measurements on a pulsed rf inductively coupled plasma
    Guo, W
    DeJoseph, CA
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2001, 10 (01): : 43 - 51
  • [7] A double inductively coupled plasma for sterilization of medical devices
    Halfmann, H.
    Bibinov, N.
    Wunderlich, J.
    Awakowicz, P.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2007, 40 (14) : 4145 - 4154
  • [8] NON-THERMAL PLASMA STERILIZATION IN RF AND MW DISCHARGES
    Azharonok, V.
    Filatova, I.
    Bosneaga, Iu
    Bologa, M.
    Shedikova, O.
    ROMANIAN JOURNAL OF PHYSICS, 2011, 56 : 62 - 68
  • [9] Titanium oxidation by rf inductively coupled plasma
    Valencia-Alvarado, R.
    de la Piedad-Beneitez, A.
    Lopez-Callejas, R.
    Barocio, S. R.
    Mercado-Cabrera, A.
    Pena-Eguiluz, R.
    Munoz-Castro, A. E.
    Rodriguez-Mendez, B. G.
    de la Rosa-Vazquez, J. M.
    15TH INTERNATIONAL CONGRESS ON PLASMA PHYSICS (ICPP2010) & 13TH LATIN AMERICAN WORKSHOP ON PLASMA PHYSICS (LAWPP2010), 2014, 511
  • [10] Inductively coupled RF plasma nitriding of steels
    Chakrabarty, CK
    Idris, A
    Wong, CS
    Kok, YC
    PROCESSING AND FABRICATION OF ADVANCED MATERIALS VI, VOLS 1 & 2, 1998, : 1197 - 1207