ZnO plasmonics for telecommunications

被引：40
|
作者：
Look, D. C. [1 ,2 ,3 ]
Leedy, K. D. [3 ]
机构：
[1] Wright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
[2] Wyle Labs Inc, Dayton, OH 45431 USA
[3] USAF, Res Lab, Sensors Directorate, Wright Patterson AFB, OH 45433 USA
来源：
APPLIED PHYSICS LETTERS | 2013年 / 102卷 / 18期
基金：
美国国家科学基金会;
关键词：
D O I：
10.1063/1.4804984
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Plasmonic resonances (kres's) at the telecommunication wavelengths of 1.3 and 1.55 mu m can be accurately produced in ZnO layers grown at 200 degrees C by pulsed laser deposition in pure Ar ambient using a ZnO target with 3 wt. % Ga2O3, and then annealed in air to produce Hall-effect-determined carrier concentrations 8.8 and 6.0 x 10(20) cm(-3), respectively. Appropriate values of concentration and Hall mobility for a desired lambda(res) can be conveniently determined from a "plasmonic resonance phase diagram," generated from the Drude equation and mobility theory. Values of lambda(res) as low as 1 mu m can be attained in ZnO. (C) 2013 AIP Publishing LLC.
引用
收藏
页数：4
相关论文
共 50 条
  • [1] Plasmonics for Telecommunications Applications
    Carvalho, William O. F.
    Ricardo Mejia-Salazar, J.
    SENSORS, 2020, 20 (09)
  • [2] Infrared Plasmonics via ZnO
    Allen, J. W.
    Allen, M. S.
    Look, D. C.
    Wenner, B. R.
    Itagaki, N.
    Matsushima, K.
    Surhariadi, I.
    JOURNAL OF NANO RESEARCH, 2014, 28 : 109 - 119
  • [3] Application of highly conductive ZnO to plasmonics
    Allen, M. S.
    Allen, J. W.
    Wenner, B. R.
    Look, D. C.
    Leedy, K. D.
    OXIDE-BASED MATERIALS AND DEVICES IV, 2013, 8626
  • [4] Plasmonics Properties of ZnO/Ag/ZnO Multilayer Thin Films
    Venugopal, N.
    Mitra, Anirban
    ADVANCES IN MATERIALS AND PROCESSING: CHALLENGES AND OPPORTUNITIES, 2012, 585 : 214 - 218
  • [5] Defects in highly conductive ZnO for transparent electrodes and plasmonics
    Look, D. C.
    Leedy, K. D.
    Thomson, D. B.
    Wang, B.
    JOURNAL OF APPLIED PHYSICS, 2014, 115 (01)
  • [6] Development of ZnO films for near-IR plasmonics
    Look, David C.
    Leedy, K. D.
    Agresta, D. L.
    PHYSICS AND SIMULATION OF OPTOELECTRONIC DEVICES XXII, 2014, 8980
  • [7] PLASMONICS Electrifying plasmonics on silicon
    Hryciw, Aaron
    Jun, Young Chul
    Brongersma, Mark L.
    NATURE MATERIALS, 2010, 9 (01) : 3 - 4
  • [8] Sustainable plasmonics and plasmonics for sustainability
    Halas, Naomi
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2016, 251
  • [9] Molecular Plasmonics (Editorial to Special Issue “Molecular Plasmonics” of the journal Plasmonics)
    Wolfgang Fritzsche
    Plasmonics, 2006, 1 : 3 - 3
  • [10] Molecular Plasmonics -: (Editorial to special issue "Molecular plasmonics" of the journal Plasmonics)
    Fritzsche, Wolfgang
    PLASMONICS, 2006, 1 (01) : 3 - 3
12345