Thermodynamic and experimental studies of β-Ga2O3 growth by metalorganic vapor phase epitaxy

被引:22
|
作者
Goto, Ken [1 ]
Ikenaga, Kazutada [1 ,2 ]
Tanaka, Nami [1 ]
Ishikawa, Masato [3 ]
Machida, Hideaki [3 ]
Kumagai, Yoshinao [1 ,4 ]
机构
[1] Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
[2] Taiyo Nippon Sanso Corp, Minato Ku, Tokyo 1080014, Japan
[3] Gas Phase Growth Ltd, Koganei, Tokyo 1840012, Japan
[4] Tokyo Univ Agr & Technol, Inst Global Innovat Res, Koganei, Tokyo 1848588, Japan
基金
日本学术振兴会;
关键词
HOMOEPITAXIAL GROWTH; THIN-FILMS; LAYERS; MOCVD; MOVPE; SI;
D O I
10.35848/1347-4065/abec9d
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thermodynamic analysis and experimental demonstration of beta-Ga2O3 growth by metalorganic vapor phase epitaxy using triethylgallium (TEG) and oxygen (O-2) precursors were performed. Thermodynamic analysis revealed that the O-2 supplied is preferentially used for the combustion of hydrocarbons and H-2 derived from TEG. Therefore, the use of high growth temperatures and high input VI/III ratios is essential for the complete combustion of hydrocarbons and H-2, and beta-Ga2O3 growth. The use of an inert gas as the carrier gas was also determined as necessary to grow beta-Ga2O3 at high temperatures. Based on these results, a ((2) over bar 01) oriented smooth beta-Ga2O3 layer could be grown on a c-plane sapphire substrate at 900 degrees C with a growth rate of 1.4 mu m h(-1) at an input VI/III ratio of 100. The grown layer showed a clear optical bandgap of 4.84 eV, and impurity concentrations of hydrogen and carbon were below the background levels of the measurement system. (C) 2021 The Japan Society of Applied Physics
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页数:8
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