Membranes with a plasma deposited titanium isopropoxide layer

被引:3
|
作者
Gancarz, Irena [1 ]
Bryjak, Marek [1 ]
Wolska, Joanna [1 ]
Siekierka, Anna [1 ]
Kujawski, Wojciech [2 ]
机构
[1] Wroclaw Univ Technol, PL-50370 Wroclaw, Poland
[2] Nicholas Copernicus Univ, PL-87100 Torun, Poland
来源
CHEMICAL PAPERS | 2016年 / 70卷 / 03期
关键词
plasma deposited polymer; protein fouling; membrane cleaning; CHEMICAL-VAPOR-DEPOSITION; THIN-FILMS; PHOTOCATALYTIC ACTIVITY; SOL-GEL; TIO2; FABRICATION;
D O I
10.1515/chempap-2015-0206
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Porous polypropylene membranes were coated with plasma polymerized titanium isopropoxide in a 75 kHz plasma reactor. It was noted that the presence of air in the plasma chamber in the amount of deposited polymer. Selection of the process parameters enabled obtaining membranes with up to 300 mu g cm(-2) of polymerized titanium isopropoxide. Deposition of the titanium oxide layer resulted in the reduction of permeate flux but it significantly improved the membrane photocleaning ability The recovery index reached the level of 95 % for membranes with the highest amount of the titanium oxide deposit. (C) 2015 Institute of Chemistry, Slovak Academy of Sciences
引用
收藏
页码:350 / 355
页数:6
相关论文
共 50 条
  • [31] Preparation of steel/titanium dioxide/titanium three-layer composite membranes
    V. S. Mitin
    V. I. Novikov
    A. I. Sharapaev
    A. G. Muradova
    Petroleum Chemistry, 2016, 56 : 915 - 919
  • [32] Thermal annealing of superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
    Gonzalez Diaz-Palacio, Isabel
    Wenskat, Marc
    Deyu, Getnet Kacha
    Hillert, Wolfgang
    Blick, Robert H.
    Zierold, Robert
    JOURNAL OF APPLIED PHYSICS, 2023, 134 (03)
  • [33] On the water promoted reaction of titanium isopropoxide with carbon dioxide
    Ghosh, R
    Nethaji, M
    Samuelson, AG
    CHEMICAL COMMUNICATIONS, 2003, (20) : 2556 - 2557
  • [34] Kinetics of the titanium isopropoxide decomposition in supercritical isopropyl alcohol
    Courtecuisse, VG
    Chhor, K
    Bocquet, JF
    Pommier, C
    INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH, 1996, 35 (08) : 2539 - 2545
  • [35] Hydrophobisation of electrospun nanofiber membranes by plasma deposited CF coating
    Kormunda, Martin
    Rysanek, Petr
    Kylian, Ondrej
    Benkocka, Monika
    Capkova, Pavla
    SURFACES AND INTERFACES, 2021, 26
  • [36] Titanium dioxide layer deposited at low temperature upon polyester fabrics
    Zgura, I.
    Frunza, S.
    Frunza, L.
    Enculescu, M.
    Florica, C.
    Ganea, C. P.
    Negrila, C. C.
    Diamandescu, L.
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2015, 17 (7-8): : 1055 - 1063
  • [37] Controlling the Crystallinity and Roughness of Atomic Layer Deposited Titanium Dioxide Films
    Puurunen, Riikka L.
    Sajavaara, Timo
    Santala, Eero
    Miikkulainen, Ville
    Saukkonen, Tapio
    Laitinen, Mikko
    Leskela, Markku
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2011, 11 (09) : 8101 - 8107
  • [38] Passivation of GaAs surface by atomic-layer-deposited titanium nitride
    Bosund, M.
    Aierken, A.
    Tiilikainen, J.
    Hakkarainen, T.
    Lipsanen, H.
    APPLIED SURFACE SCIENCE, 2008, 254 (17) : 5385 - 5389
  • [39] Characteristics of Al2O3 thin films deposited using dimethylaluminum isopropoxide and trimethylaluminum precursors by the plasma-enhanced atomic-layer deposition method
    Koo, J
    Kim, S
    Jeon, S
    Jeon, H
    Kim, Y
    Won, Y
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2006, 48 (01) : 131 - 136
  • [40] Modeling Titanium Oxide Growth by Chemical Vapor Deposition Using Titanium Tetra Isopropoxide
    Akiyama, Yasunobu
    Shitanaka, Katsuya
    Murakami, Hiroshi
    JOURNAL OF CHEMICAL ENGINEERING OF JAPAN, 2008, 41 (08) : 779 - 784