Photo-electrochemical Properties of Titanium Dioxide Thin Films Prepared by Reactive RF Sputtering Method

被引：0
|
作者：
Arita, Makoto [1 ]
Tabata, Yu [1 ]
Sakamoto, Hiroki [1 ]
Guo, Qixin [2 ]
机构：
[1] Kyushu Univ, Dept Mat Sci & Engn, 744 Motooka, Fukuoka 8190395, Japan
[2] Saga Univ, Dept Elect & Elect Engn, Synchrotron Light Applicat Ctr, Saga 8408502, Japan
来源：
ADVANCED MATERIALS SCIENCE AND TECHNOLOGY, (IFAMST-8) | 2013年 / 750卷
关键词：
Photo-electrochemistry; Titanium dioxide; Thin film; Reactive sputtering; Photocatalyst; PASSIVE FILMS; TIO2; ANATASE; ELECTRODE;
D O I：
10.4028/www.scientific.net/MSF.750.248
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The photo-electrochemical properties of photocatalytic titanium dioxide thin films obtained by reactive RE magnetron sputtering were investigated. The pressure during the sputtering deposition affected the photocatalytic activity and photo-induced hydrophilicity, and at 2 Pa the highest activities were observed. The photocurrent under ultraviolet light illumination corresponded to the photo-induced activities of the films. It is suggested that the band bending near the surface is one of the most crucial factors determines the activities of photo-induced behavior of the titanium dioxide thin films.
引用
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页码：248 / +
页数：2
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