Wavelength dependence of crystallization of alkoxy-derived ZrO2 thin films prepared by ultraviolet irradiation

被引：5
|
作者：
Nishizawa, K [1 ]
Miki, T [1 ]
Suzuki, K [1 ]
Kato, K [1 ]
机构：
[1] AIST, Moriyama Ku, Nagoya, Aichi 4638560, Japan
来源：
JOURNAL OF MATERIALS RESEARCH | 2005年 / 20卷 / 11期
关键词：
D O I：
10.1557/JMR.2005.0392
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Wavelength dependence was observed in the ultraviolet (UV) irradiation-assisted crystallization of alkoxy-derived ZrO2 thin films. The Surface grains of thin films deposited on Si(100) Substrates became enlarged by UV irradiation using ail ultrahigh-pressure mercury larnp. The crystallinity of thin films deposited on Si(100) substrates was improved by UV irradiation using a low-pressure mercury lamp. The reaction using the ultrahigh-pressure mercury lamp depended on the Substrate type.
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页码：3133 / 3140
页数：8
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