Synthesis of few-layer graphene via microwave plasma-enhanced chemical vapour deposition

被引:411
|
作者
Malesevic, Alexander [1 ,2 ]
Vitchev, Roumen [1 ]
Schouteden, Koen [2 ]
Volodin, Alexander [2 ]
Zhang, Liang [3 ]
Van Tendeloo, Gustaaf [3 ]
Vanhulsel, Annick [1 ]
Van Haesendonck, Chris [2 ]
机构
[1] Flemish Inst Technol Res, VITO Mat, Boeretang 200, BE-2400 Mol, Belgium
[2] Katholieke Univ Leuven, Lab Solid State Phys & Magnetism, BE-3001 Louvain, Belgium
[3] Univ Antwerp, BE-2020 Antwerp, Belgium
关键词
D O I
10.1088/0957-4484/19/30/305604
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
If graphene is ever going to live up to the promises of future nanoelectronic devices, an easy and cheap route for mass production is an essential requirement. A way to extend the capabilities of plasma-enhanced chemical vapour deposition to the synthesis of freestanding few-layer graphene is presented. Micrometre-wide flakes consisting of four to six atomic layers of stacked graphene sheets have been synthesized by controlled recombination of carbon radicals in a microwave plasma. A simple and highly reproducible technique is essential, since the resulting flakes can be synthesized without the need for a catalyst on the surface of any substrate that withstands elevated temperatures up to 700 degrees C. A thorough structural analysis of the flakes is performed with electron microscopy, x-ray diffraction, Raman spectroscopy and scanning tunnelling microscopy. The resulting graphene flakes are aligned vertically to the substrate surface and grow according to a three-step process, as revealed by the combined analysis of electron microscopy and x-ray photoelectron spectroscopy.
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页数:6
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