Modulation interference microscope as a tool for measuring the linear dimensions of nanostructures

被引：0

作者：

Andreev, A. G. ^{[1
]}

Grigoriev, S. N. ^{[1
]}

Romash, E. V. ^{[1
]}

Bushuev, S. V. ^{[1
]}

Ignatiev, P. S. ^{[1
]}

Loparev, A. V. ^{[1
]}

Indukaev, K. V. ^{[1
]}

Osipov, P. A. ^{[1
]}

机构：

[1] Moscow State Technol Univ STANKIN, Moscow, Russia

来源：

MEASUREMENT TECHNIQUES | 2012年 / 55卷 / 05期

关键词：

modulation interference microscope; nanometrology; RESOLUTION;

D O I：

10.1007/s11018-012-9996-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A new version of a modulation interference microscope with long-path coordinate table resting on aeromagnetic guides that enables travel of the microscope with deviation from linearity of at most 0.1 mu m on path lengths up to 300 mm has been developed. The metrological aspects of the use of the microscope for measurement of the linear dimensions of nanostructures are considered. Results of measurements of the basic parameters of the topology of integrated circuits are presented.

引用

页码：542 / 545

页数：4

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