Al-M (M = Cr, Fe, Mn, Ni) thin-film negative electrode materials

被引：41

作者：

Fleischauer, MD ^{[1
]}

Obrovac, MN

McGraw, JD

Dunlap, RA

Topple, JM

Dahn, JR

机构：

[1] Dalhousie Univ, Dept Phys & Atmospher Sci, Halifax, NS B3H 3J5, Canada

[2] 3M Co, Elect & Inorgan Technol Ctr, St Paul, MN 55144 USA

[3] Dalhousie Univ, Mat Res Inst, Halifax, NS B3H 3J5, Canada

[4] Queens Univ, Dept Engn Phys, Kingston, ON K7L 3N6, Canada

[5] Dalhousie Univ, Dept Chem, Halifax, NS B3H 3J5, Canada

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 2006年 / 153卷 / 03期

关键词：

D O I：

10.1149/1.2161569

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Comprehensive investigations of thin-film Al-M (M = Cr, Fe, Mn, Ni) negative electrode material libraries were performed using combinatorial and high-throughput techniques. Mossbauer effect spectroscopy and X-ray diffraction were used to characterize library structure. The electrochemical performance of over 200 compositions of AlxM1-x (0.75 < x < 1) was determined at both room and elevated temperature. All AlxM1-x alloys are completely inactive above 15 atom % M. Thermodynamic calculations based on the macroscopic atom model of de Boer et al. predict compositions with at least 33-65 atom % M to be inactive. A phenomenological model to describe the observed capacity as a function of transition metal content and cycling temperature is presented. (c) 2006 The Electrochemical Society.

引用

页码：A484 / A491

页数：8

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