Energy based model to assess interfacial adhesion using a scratch test

被引:14
|
作者
Le Houerou, Vincent [1 ]
Gauthier, Christian [1 ]
Schirrer, Robert [1 ]
机构
[1] Inst Charles Sadron, CNRS, UPR 022, F-67034 Strasbourg 2, France
关键词
D O I
10.1007/s10853-008-2869-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A common way to improve the scratch resistance of a sensitive surface is to coat it with a thin film. However, the substrate/thin film adhesion must be well controlled and measurable. The contribution of the present work is to propose a global energy balance model of the blistering process for the scratching of a substrate/thin film system, which permits one to determine the adhesion of the system. The adhesion can be measured by following the delaminated area as a function of the scratching distance during blistering. The particular case of an experimental stable blistering process was studied and the corresponding substrate/thin film adhesion was derived using the global energy balance model.
引用
收藏
页码:5747 / 5754
页数:8
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