Performance Comparison of InAs, InSb, and GaSb n-Channel Nanowire Metal-Oxide-Semiconductor Field-Effect Transistors in the Ballistic Transport Limit

被引:7
|
作者
Shimoida, Kenta [1 ]
Tsuchiya, Hideaki [1 ,2 ]
Kamakura, Yoshinari [2 ,3 ]
Mori, Nobuya [2 ,3 ]
Ogawa, Matsuto [1 ]
机构
[1] Kobe Univ, Grad Sch Engn, Dept Elect & Elect Engn, Kobe, Hyogo 6578501, Japan
[2] Japan Sci & Technol Agcy, CREST, Chiyoda Ku, Tokyo 1020076, Japan
[3] Osaka Univ, Div Elect Elect & Informat Engn, Grad Sch Engn, Suita, Osaka 5650871, Japan
基金
日本学术振兴会; 日本科学技术振兴机构;
关键词
CARRIER-TRANSPORT;
D O I
10.7567/APEX.6.034301
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ballistic performances of InAs, InSb, and GaSb nanowire field-effect transistors (NWFETs) were theoretically investigated. We found that InAs and InSb NWFETs exhibit similar device performances due to 1D band structure effects. Furthermore, although these In-based NWFETs suffer from the density-of-states (DOS) bottleneck, a lower power switching is expected. On the other hand, GaSb NWs have multiple energy subbands at conduction band minima, as a result of the projection of L-valleys which thus improves the DOS. In particular, a (110)-oriented GaSb NW has an improved DOS and a high electron velocity simultaneously, and thus, it could be a strong competitor to In-based NWFETs. (C) 2013 The Japan Society of Applied Physics
引用
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页数:4
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