Performance Comparison of InAs, InSb, and GaSb n-Channel Nanowire Metal-Oxide-Semiconductor Field-Effect Transistors in the Ballistic Transport Limit

被引:7
|
作者
Shimoida, Kenta [1 ]
Tsuchiya, Hideaki [1 ,2 ]
Kamakura, Yoshinari [2 ,3 ]
Mori, Nobuya [2 ,3 ]
Ogawa, Matsuto [1 ]
机构
[1] Kobe Univ, Grad Sch Engn, Dept Elect & Elect Engn, Kobe, Hyogo 6578501, Japan
[2] Japan Sci & Technol Agcy, CREST, Chiyoda Ku, Tokyo 1020076, Japan
[3] Osaka Univ, Div Elect Elect & Informat Engn, Grad Sch Engn, Suita, Osaka 5650871, Japan
基金
日本学术振兴会; 日本科学技术振兴机构;
关键词
CARRIER-TRANSPORT;
D O I
10.7567/APEX.6.034301
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ballistic performances of InAs, InSb, and GaSb nanowire field-effect transistors (NWFETs) were theoretically investigated. We found that InAs and InSb NWFETs exhibit similar device performances due to 1D band structure effects. Furthermore, although these In-based NWFETs suffer from the density-of-states (DOS) bottleneck, a lower power switching is expected. On the other hand, GaSb NWs have multiple energy subbands at conduction band minima, as a result of the projection of L-valleys which thus improves the DOS. In particular, a (110)-oriented GaSb NW has an improved DOS and a high electron velocity simultaneously, and thus, it could be a strong competitor to In-based NWFETs. (C) 2013 The Japan Society of Applied Physics
引用
收藏
页数:4
相关论文
共 50 条
  • [31] Impacts of SiN deposition parameters on n-channel metal-oxide-semiconductor field-effect-transistors
    Lu, Ching-Sen
    Lin, Horng-Chih
    Huang, Tiao-Yuan
    SOLID-STATE ELECTRONICS, 2008, 52 (10) : 1584 - 1588
  • [32] Vertical InAs/InGaAs Heterostructure Metal-Oxide-Semiconductor Field-Effect Transistors on Si
    Kilpi, Olli-Pekka
    Svensson, Johannes
    Wu, Jun
    Persson, Axel R.
    Wallenberg, Reine
    Lind, Erik
    Wernersson, Lars-Erik
    NANO LETTERS, 2017, 17 (10) : 6006 - 6010
  • [33] Temperature dependence of shallow-trench-isolation mechanical stress on n-channel metal-oxide-semiconductor field-effect transistors
    Lai, JH
    Gong, J
    Liao, TH
    Chen, DCH
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2004, 43 (7A): : 4161 - 4162
  • [34] Impact of the channel thickness on the performance of Schottky barrier metal-oxide-semiconductor field-effect transistors
    Knoch, J
    Appenzeller, J
    APPLIED PHYSICS LETTERS, 2002, 81 (16) : 3082 - 3084
  • [35] Scheme for the fabrication of ultrashort channel metal-oxide-semiconductor field-effect transistors
    Appenzeller, J
    Martel, R
    Solomon, P
    Chan, K
    Avouris, P
    Knoch, J
    Benedict, J
    Tanner, M
    Thomas, S
    Wang, KL
    del Alamo, JA
    APPLIED PHYSICS LETTERS, 2000, 77 (02) : 298 - 300
  • [36] Surface and core contribution to 1/f-noise in InAs nanowire metal-oxide-semiconductor field-effect transistors
    Persson, K. -M.
    Malm, B. G.
    Wernersson, L. -E.
    APPLIED PHYSICS LETTERS, 2013, 103 (03)
  • [37] A Model of channel current for uniaxially strained Si n-channel metal-oxide-semiconductor field-effect transistor
    Lu Yi
    Zhang He-Ming
    Hu Hui-Yong
    Yang Jin-Yong
    Yin Shu-Juan
    Zhou Chun-Yu
    ACTA PHYSICA SINICA, 2015, 64 (19)
  • [38] Technology for the fabrication of ultrashort channel metal-oxide-semiconductor field-effect transistors
    Knoch, J
    Appenzeller, J
    Lengeler, B
    Martel, R
    Solomon, P
    Avouris, P
    Dieker, C
    Lu, Y
    Wang, KL
    Scholvin, J
    del Alamo, JA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (04): : 1737 - 1741
  • [39] Experimental evidence of ballistic transport in cylindrical gate-all-around twin silicon nanowire metal-oxide-semiconductor field-effect transistors
    Cho, K. H.
    Yeo, K. H.
    Yeoh, Y. Y.
    Suk, S. D.
    Li, M.
    Lee, J. M.
    Kim, M. -S.
    Kim, D. -W.
    Park, D.
    Hong, B. H.
    Jung, Y. C.
    Hwang, S. W.
    APPLIED PHYSICS LETTERS, 2008, 92 (05)
  • [40] Dependence of Hot Carrier Reliability and Low Frequency Noise on Channel Stress in Nanoscale n-Channel Metal-Oxide-Semiconductor Field-Effect Transistors
    Kwon, Hyuk-Min
    Bok, Jung-Deuk
    Han, In-Shik
    Park, Sang-Uk
    Jung, Yi-Jung
    Jang, Jae-Hyung
    Ko, Sung-Yong
    Lee, Won-Mook
    Lee, Ga-Won
    Lee, Hi-Deok
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (10)