Hopping current density in amorphous carbon/crystalline silicon heterojunctions

被引:8
|
作者
Katsuno, T.
Godet, C.
Loir, A. S.
Garrelie, F.
机构
[1] Ecole Polytech, CNRS, UMR 7647, Lab Phys Interfaces & Couches Minces, F-91128 Palaiseau, France
[2] Univ St Etienne, CNRS, UMR 5516, Lab Traitement Signal & Instrumentat, F-42000 St Etienne 02, France
关键词
amorphous semiconductors; heterojunctions; electrical and electronic properties; conductivity; laser deposition; carbon; diamond-like carbon;
D O I
10.1016/j.jnoncrysol.2005.09.038
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
High density amorphous carbon (a-C) films deposited by femtosecond pulsed laser ablation were incorporated in p-type c-Si/a-C/Al devices. Rectifying I-V characteristics were measured versus temperature T(200-300 K). At low fields, the conductivity behaves as Ln(sigma/sigma degrees degrees) = -(T-0/T)(1/4), corresponding to 3D hopping transport. As the electric field F increases from 10(4) to 10(5) V cm(-1), the decrease of both apparent slope T-0(1/4)(F) from 230 to 100 K-1/4 and prefactor sigma degrees degrees(F) from 10(16) to 10(4) S cm(-1) is quantitatively similar for forward and reverse bias, with however a shift Delta V of 0.28 eV attributed to the heterojunction built-in potential. The observed strong decrease in the apparent prefactor sigma degrees degrees(F) is consistent with recent modeling of field-enhanced hopping transport in exponential band tails. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:1421 / 1424
页数:4
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