Hopping current density in amorphous carbon/crystalline silicon heterojunctions

被引:8
|
作者
Katsuno, T.
Godet, C.
Loir, A. S.
Garrelie, F.
机构
[1] Ecole Polytech, CNRS, UMR 7647, Lab Phys Interfaces & Couches Minces, F-91128 Palaiseau, France
[2] Univ St Etienne, CNRS, UMR 5516, Lab Traitement Signal & Instrumentat, F-42000 St Etienne 02, France
关键词
amorphous semiconductors; heterojunctions; electrical and electronic properties; conductivity; laser deposition; carbon; diamond-like carbon;
D O I
10.1016/j.jnoncrysol.2005.09.038
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
High density amorphous carbon (a-C) films deposited by femtosecond pulsed laser ablation were incorporated in p-type c-Si/a-C/Al devices. Rectifying I-V characteristics were measured versus temperature T(200-300 K). At low fields, the conductivity behaves as Ln(sigma/sigma degrees degrees) = -(T-0/T)(1/4), corresponding to 3D hopping transport. As the electric field F increases from 10(4) to 10(5) V cm(-1), the decrease of both apparent slope T-0(1/4)(F) from 230 to 100 K-1/4 and prefactor sigma degrees degrees(F) from 10(16) to 10(4) S cm(-1) is quantitatively similar for forward and reverse bias, with however a shift Delta V of 0.28 eV attributed to the heterojunction built-in potential. The observed strong decrease in the apparent prefactor sigma degrees degrees(F) is consistent with recent modeling of field-enhanced hopping transport in exponential band tails. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:1421 / 1424
页数:4
相关论文
共 50 条
  • [31] Band lineup in amorphous/crystalline silicon heterojunctions and the impact of hydrogen microstructure and topological disorder
    Schulze, T. F.
    Korte, L.
    Ruske, F.
    Rech, B.
    PHYSICAL REVIEW B, 2011, 83 (16):
  • [32] ELECTRICAL-PROPERTIES OF N-AMORPHOUS P-CRYSTALLINE SILICON HETEROJUNCTIONS
    MATSUURA, H
    OKUNO, T
    OKUSHI, H
    TANAKA, K
    JOURNAL OF APPLIED PHYSICS, 1984, 55 (04) : 1012 - 1019
  • [33] SEMICONDUCTING AMORPHOUS-CARBON FILMS AND CARBON-SINGLE-CRYSTAL SILICON HETEROJUNCTIONS
    BHAGAVAT, GK
    NAYAK, KD
    THIN SOLID FILMS, 1979, 64 (01) : 57 - 62
  • [34] Interface state density distribution in amorphous/crystalline silicon heterostructures
    Iyer, Suman B.
    Kumar, Vikram
    Harshavardhan, K.S.
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1989, 28 (05): : 744 - 746
  • [35] INTERFACE STATE DENSITY DISTRIBUTION IN AMORPHOUS CRYSTALLINE SILICON HETEROSTRUCTURES
    IYER, SB
    KUMAR, V
    HARSHAVARDHAN, KS
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1989, 28 (05): : L744 - L746
  • [36] Wide Bandgap Heterojunctions on Crystalline Silicon
    Sturm, J. C.
    Avasthi, S.
    Nagamatsu, K.
    Jhaveri, J.
    McClain, W.
    Man, G.
    Kahn, A.
    Schwartz, J.
    Wagner, S.
    ULSI PROCESS INTEGRATION 8, 2013, 58 (09): : 97 - 105
  • [37] CHARACTERISTICS OF ELECTRON-SPIN RESONANCE IN HYDROGENATED AMORPHOUS SILICON-CARBON HYDROGENATED AMORPHOUS-SILICON HETEROJUNCTIONS
    CHEN, GG
    SUN, GS
    ZHANG, FQ
    APPLIED PHYSICS LETTERS, 1989, 54 (09) : 807 - 809
  • [38] HETEROJUNCTIONS OF INP WITH AMORPHOUS HYDROGENATED SILICON
    WU, S
    HANEMAN, D
    JOURNAL OF APPLIED PHYSICS, 1993, 74 (09) : 5904 - 5906
  • [40] Device characterization for amorphous diamond-like carbon-silicon heterojunctions
    Konofaos, N
    Evangelou, E
    Thomas, CB
    JOURNAL OF APPLIED PHYSICS, 1998, 84 (08) : 4634 - 4636