Characterization of electroplated, thick permalloy films

被引：4
|
作者：
Getlawi, S. [1 ]
Theis, M. [2 ]
Friedrich, S.
Koblischka-Veneva, A. [3 ]
Koblischka, M. R. [1 ]
Saumer, M. [2 ]
Hartmann, U. [1 ]
机构：
[1] Univ Saarland, Inst Expt Phys, D-66041 Saarbrucken, Germany
[2] Univ Appl Sci Kaiserslautern, Dept Microsyst Technol, D-66482 Zweibrucken, Germany
[3] Univ Saarland, Inst Funct Mat, D-66041 Saarbrucken, Germany
来源：
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2008年 / 205卷 / 08期
关键词：
D O I：
10.1002/pssa.200723621
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Permalloy (Ni81Fe19) films and foils were fabricated by means of electroplating. Two different types of samples were produced, (i) a patterned permalloy film on a Si wafer (type 1) and (ii) a NiFe foil (type 2), which was separated from the substrate after deposition. The samples were characterized employing magnetic force microscopy (MFM), transmission electron microscopy (TEM) and electron-backscatter diffraction (EBSD). On the foil type sample, MFM reveals a maze domain pattern, and on the structured samples (type 1), a Landau domain pattern is obtained. EBSD enables the identification of the permalloy Kikuchi pattern without the effect of a substrate. The analysis reveals randomly oriented grains with a narrow size distribution. (C) 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码：1809 / 1812
页数：4
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