Analytical electron microscopy interface layers between Ti(6% Al, 4% V) and a CrN cathodic arc coating

被引:1
|
作者
MacKenzie, M [1 ]
Craven, AJ
Nicholson, WAP
Hatto, P
机构
[1] Univ Glasgow, Dept Phys & Astron, Glasgow G12 8QQ, Lanark, Scotland
[2] IonBond Ltd, Durham DH8 6TS, England
关键词
D O I
10.1088/0022-3727/35/8/309
中图分类号
O59 [应用物理学];
学科分类号
摘要
This paper reports on the applications of analytical electron microscopy to the study of cathodic arc deposited CrN coating on a Ti(6% Al, 4% V) substrate. Particular attention is given to analysis of the coating/substrate interface. Electron energy loss spectroscopy is used to show that the Cr sputter cleaning of the Ti(6% Al, 4% V) results in penetration of Cr into the substrate giving a bcc alloy layer whose composition varies from Ti(6% Al, 4% V) at the substrate interface to almost pure Cr at the coating interface. Subsequent deposition of CrN results in an initial deposition of sub-stoichiometric Cr2N followed by sub-stoichiometric CrN with a {022} texture and a columnar structure. The degree of sub-stoichiometry of the nitrides depends on the substrate bias and the substrate orientation relative to the cathode.
引用
收藏
页码:779 / 787
页数:9
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