Interface Mixing in Fe/Si Multilayers Observed by the In Situ Conductance Measurements

被引:2
|
作者
Chomiuk, P. [1 ]
Blaszyk, M. [1 ]
Szymanski, B. [1 ]
Lucinski, T. [1 ]
机构
[1] Polish Acad Sci, Inst Mol Phys, PL-60179 Poznan, Poland
关键词
D O I
10.12693/APhysPolA.115.355
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
In this contribution the in situ conductance vs. deposition time dependences of Fe/Si multilayers are analysed. The plot of resistance multiplied by the square of the thickness as a function of iron thickness shows that during the iron deposition initially amorphous-like Fe-Si mixture is formed, next the mixture crystallises, and finally bcc-Fe phase appears. The interface mixing is also manifested by the reduction of the total multilayer thickness measured by small angle. X-ray diffraction.
引用
收藏
页码:355 / 356
页数:2
相关论文
共 50 条
  • [21] Enhanced interface mixing of Fe/Si bilayers on preamorphized silicon substrates
    Bibic, N.
    Milinovic, V.
    Lieb, K. P.
    Milosavljevic, M.
    Schrempel, F.
    APPLIED PHYSICS LETTERS, 2007, 90 (05)
  • [22] Mixing induced by swift heavy ion irradiation at Fe/Si interface
    Sisodia, V
    Jain, IP
    BULLETIN OF MATERIALS SCIENCE, 2004, 27 (04) : 393 - 394
  • [23] Interface roughness in Mo/Si multilayers
    Nedelcu, I.
    de Kruijs, R. W. E. van
    Yakshin, A. E.
    Tichelaar, F.
    Zoethout, E.
    Louis, E.
    Enkisch, H.
    Muellender, S.
    Bijkerk, F.
    THIN SOLID FILMS, 2006, 515 (02) : 434 - 438
  • [24] Interface characterization of Mo/Si multilayers
    赵娇玲
    贺洪波
    王虎
    易葵
    王斌
    崔云
    Chinese Optics Letters, 2016, 14 (08) : 102 - 105
  • [25] INTERFACE IMPERFECTIONS IN METAL/SI MULTILAYERS
    WINDT, DL
    HULL, R
    WASKIEWICZ, WK
    JOURNAL OF APPLIED PHYSICS, 1992, 71 (06) : 2675 - 2678
  • [26] Interface characterization of Mo/Si multilayers
    Zhao, Jiaoling
    He, Hongbo
    Wang, Hu
    Yi, Kui
    Wang, Bin
    Cui, Yun
    CHINESE OPTICS LETTERS, 2016, 14 (08)
  • [27] Interface study of Sc/Si multilayers
    Zhu, Jingtao
    Ji, Bin
    Jiang, Hui
    Zhu, Jie
    Zhu, Shengming
    Li, Miao
    Zhang, Jiayi
    APPLIED SURFACE SCIENCE, 2020, 515 (515)
  • [28] KINETICS OF THE FORMATION OF C49 TISI2 FROM TI-SI MULTILAYERS AS OBSERVED BY IN-SITU STRESS MEASUREMENTS
    JONGSTE, JF
    ALKEMADE, PFA
    JANSSEN, GCAM
    RADELAAR, S
    JOURNAL OF APPLIED PHYSICS, 1993, 74 (06) : 3869 - 3879
  • [29] Features of diffusion mixing in Mo/Si multilayers
    Penkov, A. V.
    Voronov, D. L.
    Devizenko, A. Yu.
    Ponomarenko, A. G.
    Zubarev, E. N.
    FUNCTIONAL MATERIALS, 2005, 12 (04): : 750 - 754
  • [30] Interface magnetoresistance of Fe/Ag multilayers
    Balogh, J
    Vincze, I
    Kaptás, D
    Kemény, T
    Pusztai, T
    Kiss, LF
    Szilágyi, E
    Zolnai, Z
    Kézsmárki, I
    Halbritter, A
    Mihály, G
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 2002, 189 (03): : 621 - 624