Self-assembling processes involved in the molecular beam epitaxy growth of stacked InAs/InP quantum wires

被引：4
|
作者：
Ulloa, J. M. [1 ]
Koenraad, P. M. [1 ]
Fuster, D. [2 ]
Gonzalez, L. [2 ]
Gonzalez, Y. [2 ]
Gonzalez, M. U. [2 ]
机构：
[1] Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands
[2] CNM CSIC, Inst Microelect Madrid, Madrid 28760, Spain
来源：
NANOTECHNOLOGY | 2008年 / 19卷 / 44期
关键词：
D O I：
10.1088/0957-4484/19/44/445601
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The growth mechanism of stacked InAs/InP(001) quantum wires (QWRs) is studied by combining an atomic-scale cross-sectional scanning tunnelling microscopy analysis with in situ and in real-time stress measurements along the [110] direction (sensitive to stress relaxation during QWR formation). QWRs in stacked layers grow by a non-Stranski-Krastanov (SK) process which involves the production of extra InAs by strain-enhanced As/P exchange and a strong strain driven mass transport. Despite the different growth mechanism of the QWR between the first and following layers of the stack, the QWRs maintain on average the same shape and composition in all the layers of the stack, revealing the high stability of this QWR configuration.
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页数：4
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