Preparation for B4C/Mo2C multilayer deposition of alternate multilayer gratings with high efficiency in the 0.5-2.5 keV energy range

被引：4

作者：

Choueikani, Fadi ^{[1
,2
]}

Delmotte, Franck ^{[1
]}

Bridou, Francoise ^{[1
]}

Lagarde, Bruno ^{[2
]}

Mercere, Pascal ^{[2
]}

Otero, Edwige ^{[2
]}

Ohresser, Philippe ^{[2
]}

Polack, Francois ^{[2
]}

机构：

[1] Univ Paris 11, CNRS, Inst Opt, Lab Charles Fabry, 2 Ave Augustin Fresnel, F-91127 Palaiseau, France

[2] Synchrotron SOLEIL, F-91192 Gif Sur Yvette, France

来源：

11TH INTERNATIONAL CONFERENCE ON SYNCHROTRON RADIATION INSTRUMENTATION (SRI 2012) | 2013年 / 425卷

关键词：

D O I：

10.1088/1742-6596/425/15/152007

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

This paper presents a study of B4C/Mo2C multilayers mirrors with the aim of using it in the achievement of Alternate MultiLayer (AML) grating. Such component allows a high efficiency in the 500-2500 eV energy range for the DEIMOS beamline. Multilayers were deposited on silicon substrate. They are characterized by reflectometry under grazing incidence. Numerical adjustments were performed with a model of two layers in the period without any interfacial. A prototype of AML grating was fabricated and characterized. The efficiency of the first order of diffraction was worth 15% at 1700 eV.

引用

页数：5

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