Preparation for B4C/Mo2C multilayer deposition of alternate multilayer gratings with high efficiency in the 0.5-2.5 keV energy range

被引：4
|
作者：
Choueikani, Fadi [1 ,2 ]
Delmotte, Franck [1 ]
Bridou, Francoise [1 ]
Lagarde, Bruno [2 ]
Mercere, Pascal [2 ]
Otero, Edwige [2 ]
Ohresser, Philippe [2 ]
Polack, Francois [2 ]
机构：
[1] Univ Paris 11, CNRS, Inst Opt, Lab Charles Fabry, 2 Ave Augustin Fresnel, F-91127 Palaiseau, France
[2] Synchrotron SOLEIL, F-91192 Gif Sur Yvette, France
来源：
11TH INTERNATIONAL CONFERENCE ON SYNCHROTRON RADIATION INSTRUMENTATION (SRI 2012) | 2013年 / 425卷
关键词：
D O I：
10.1088/1742-6596/425/15/152007
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
This paper presents a study of B4C/Mo2C multilayers mirrors with the aim of using it in the achievement of Alternate MultiLayer (AML) grating. Such component allows a high efficiency in the 500-2500 eV energy range for the DEIMOS beamline. Multilayers were deposited on silicon substrate. They are characterized by reflectometry under grazing incidence. Numerical adjustments were performed with a model of two layers in the period without any interfacial. A prototype of AML grating was fabricated and characterized. The efficiency of the first order of diffraction was worth 15% at 1700 eV.
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页数：5
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