Hybrid lithography: Combining UV-exposure and two photon direct laser writing

被引：19
|
作者：
Eschenbaum, Carsten [1 ]
Grossmann, Daniel
Dopf, Katja
Kettlitz, Siegfried
Bocksrocker, Tobias
Valouch, Sebastian
Lemmer, Uli
机构：
[1] Karlsruhe Inst Technol, Light Technol Inst, D-76131 Karlsruhe, Germany
来源：
OPTICS EXPRESS | 2013年 / 21卷 / 24期
关键词：
FLUORESCENCE; POLYMERIZATION; MICROFABRICATION; MICROCHANNEL; FABRICATION; ABSORPTION; OBJECTS;
D O I：
10.1364/OE.21.029921
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We demonstrate a method for the combination of UV-lithography and direct laser writing using two-photon polymerization (2PP-DLW). First a dye doped photoresist is used for UV-lithography. Adding an undoped photoresist on top of the developed structures enables three-dimensional alignment of the 2PP-DLW structures by detecting the spatially varying fluorescence of the two photoresists. Using this approach we show three dimensional alignment by adding 3D structures made by 2PP-DLW to a previously UV-exposed structure. Furthermore, a fluidic system with an integrated total internal reflection mirror to observe particles in a microfluidic channel is demonstrated. (C) 2013 Optical Society of America
引用
收藏
页码：29921 / 29926
页数：6
相关论文
共 50 条
  • [1] High-Speed Parallel Two -Photon Laser Direct Writing Lithography System
    Wang Hongqing
    Wen Jisen
    Yang Zhenyao
    Tang Mengbo
    Sun Qiuyuan
    Ma Chengpeng
    Wang Ziang
    Zhan Lanxin
    Zhang Xiaoyi
    Cao Chun
    Shen Xiaoming
    Ding Chenliang
    Kuang Cuifang
    [J]. CHINESE JOURNAL OF LASERS-ZHONGGUO JIGUANG, 2022, 49 (22):
  • [2] Combining two-photon-polymerization with UV-lithography for laser particle acceleration targets
    Abel, T.
    Doerr, R.
    Krueger, W.
    Horstmann, R.
    Schaumann, G.
    Roth, M.
    Schlaak, H. F.
    [J]. 6TH TARGET FABRICATION WORKSHOP (TFW6) AND THE TARGETRY FOR HIGH REPETITION RATE LASER-DRIVEN SOURCES (TARG3) CONFERENCE, 2018, 1079
  • [3] Direct writing immersion laser lithography on graphene monolayers using two-photon absorption
    Zhang, Jianran
    Strobel, Carsten
    Estel, Kathrin
    Mikolajick, Thomas
    Kirchner, Robert
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2023, 41 (06):
  • [4] Optimization of exposure parameters for direct laser writing in optical lithography
    Kohut, Tomas
    Toberny, Jakub
    Postava, Kamil
    [J]. 22ND POLISH-SLOVAK-CZECH OPTICAL CONFERENCE ON WAVE AND QUANTUM ASPECTS OF CONTEMPORARY OPTICS, 2022, 12502
  • [5] Hybrid exposure strategy: Combining e-beam direct writing with optical lithography for magnetic recording heads
    Yang, XM
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2005, 23 (06): : 2624 - 2630
  • [6] LASER SCANNER FOR DIRECT WRITING LITHOGRAPHY
    RENSCH, C
    HELL, S
    VONSCHICKFUS, M
    HUNKLINGER, S
    [J]. APPLIED OPTICS, 1989, 28 (17): : 3754 - 3758
  • [7] Two-photon direct laser writing with metrologically traceable positioning
    Mohr-Weidenfeller, Laura
    Hofmann, Martin
    Birli, Oliver
    Häcker, Annika-Verena
    Reinhardt, Carsten
    Manske, Eberhard
    [J]. Technisches Messen, 2021, 88 (S1):
  • [8] A NANOCHANNEL FABRICATION TECHNIQUE BY TWO-PHOTON DIRECT LASER WRITING
    Heo, Y. J.
    Iwanaga, S.
    Takeuchi, S.
    [J]. 2012 IEEE 25TH INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS (MEMS), 2012,
  • [9] Enhanced adhesion in two-photon polymerization direct laser writing
    Izard, A. G.
    Garcia, E. P.
    Dixon, M.
    Potma, E. O.
    Baldacchini, T.
    Valdevit, L.
    [J]. AIP ADVANCES, 2020, 10 (04)
  • [10] Metrological nanopositioning combined with two-photon direct laser writing
    Mohr-Weidenfeller, Laura
    Hofmann, Martin
    Birli, Oliver
    Haecker, Annika-Verena
    Reinhardt, Carsten
    Manske, Eberhard
    [J]. TM-TECHNISCHES MESSEN, 2022, 89 (7-8) : 507 - 514
12345