Two-photon direct laser writing with metrologically traceable positioning

被引：1
|
作者：
Mohr-Weidenfeller, Laura [1 ]
Hofmann, Martin [1 ]
Birli, Oliver [2 ]
Häcker, Annika-Verena [3 ]
Reinhardt, Carsten [3 ]
Manske, Eberhard [2 ]
机构：
[1] Institut für Mikro- und Nanotechnologien, Technische Universität Ilmenau, Max-Planck-Ring 12, Ilmenau,98693, Germany
[2] Institut für Prozessmess- und Sensortechnik, Technische Universität Ilmenau, Gustav-Kirchhoff-Str. 1, Ilmenau,98693, Germany
[3] Hochschule Bremen, Neustadtswall 30, Bremen,28199, Germany
来源：
Technisches Messen | 2021年 / 88卷 / S1期
关键词：
Photoresists;
D O I：
10.1515/teme-2021-0052
中图分类号：
学科分类号：
摘要：
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