Hybrid lithography: Combining UV-exposure and two photon direct laser writing

被引：19
|
作者：
Eschenbaum, Carsten [1 ]
Grossmann, Daniel
Dopf, Katja
Kettlitz, Siegfried
Bocksrocker, Tobias
Valouch, Sebastian
Lemmer, Uli
机构：
[1] Karlsruhe Inst Technol, Light Technol Inst, D-76131 Karlsruhe, Germany
来源：
OPTICS EXPRESS | 2013年 / 21卷 / 24期
关键词：
FLUORESCENCE; POLYMERIZATION; MICROFABRICATION; MICROCHANNEL; FABRICATION; ABSORPTION; OBJECTS;
D O I：
10.1364/OE.21.029921
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We demonstrate a method for the combination of UV-lithography and direct laser writing using two-photon polymerization (2PP-DLW). First a dye doped photoresist is used for UV-lithography. Adding an undoped photoresist on top of the developed structures enables three-dimensional alignment of the 2PP-DLW structures by detecting the spatially varying fluorescence of the two photoresists. Using this approach we show three dimensional alignment by adding 3D structures made by 2PP-DLW to a previously UV-exposed structure. Furthermore, a fluidic system with an integrated total internal reflection mirror to observe particles in a microfluidic channel is demonstrated. (C) 2013 Optical Society of America
引用
收藏
页码：29921 / 29926
页数：6
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