Atomic force microscopy investigation of the effects of annealing on amorphous carbon nitride films deposited by r.f. magnetron sputtering

被引：19
|
作者：
Prioli, R
Zanette, SI
Caride, AO
Lacerda, MM
Freire, FL
机构：
[1] Ctr Brasileiro Pesquisas Fis, BR-22290180 Rio De Janeiro, Brazil
[2] Pontificia Univ Catolica Rio de Janeiro, Dept Fis, BR-22452970 Rio De Janeiro, Brazil
来源：
DIAMOND AND RELATED MATERIALS | 1999年 / 8卷 / 06期
关键词：
annealing; atomic force microscopy; carbon nitride; tribology;
D O I：
10.1016/S0925-9635(98)00453-1
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Atomic force microscopy is used to study the effects of thermal annealing on the surface topography and the tribological properties of amorphous carbon nitride thin films deposited by r.f. magnetron sputtering. The results show that the surface roughness decreases with increasing annealing temperature. The friction coefficients at the interface between a Si3N4 tip and the amorphous carbon nitride films surface decrease with increasing smoothness of the surface. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码：993 / 995
页数：3
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