Characterization of HfBx films deposited by R.F. diode and R.F. magnetron sputtering

被引：0
|
作者：
Lee, W.Y. [1 ]
Olive, G. [1 ]
Sequeda, F. [1 ]
Deline, V. [1 ]
Huang, T. [1 ]
Gorman, G. [1 ]
Chung, D.W. [1 ]
机构：
[1] IBM Research Div, United States
来源：
Thin Solid Films | 1988年 / 166卷
关键词：
Binding Energies - Impurity Concentration - Inkjet Printing Devices - Magnetron Sputtering - Photoemission Spectra - Spectrometry Depth Profiles;
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页码：131 / 138
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