共 50 条
- [31] Development of magnetically conformed stage for electron beam Projection Lithography tool Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering, 2011, 77 (07): : 668 - 675
- [32] Direct-write electron beam lithography automatically aligned with optical lithography for device fabrication LITHOGRAPHY FOR SEMICONDUCTOR MANUFACTURING, 1999, 3741 : 131 - 137
- [33] FABRICATION OF APPROXIMATELY 10 nm STRUCTURES BY ELECTRON BEAM LITHOGRAPHY. Journal of imaging science, 1986, 30 (04): : 166 - 168
- [34] Shape deviations in masks for optical structures produced by electron beam lithography Microsystem Technologies, 2004, 10 : 527 - 530
- [35] Shape deviations in masks for optical structures produced by electron beam lithography MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2004, 10 (6-7): : 527 - 530
- [38] FABRICATION OF APPROXIMATELY 10 NM STRUCTURES BY ELECTRON-BEAM LITHOGRAPHY JOURNAL OF IMAGING SCIENCE, 1986, 30 (04): : 166 - 168
- [39] Measurements and analysis of beam current and beam diameter of an electron beam lithography system MICROLITHOGRAPHIC TECHNIQUES IN IC FABRICATION, 1997, 3183 : 161 - 168
- [40] ELECTRON-BEAM INSTRUMENTS AND ELECTRON LITHOGRAPHY SOVIET JOURNAL OF OPTICAL TECHNOLOGY, 1982, 49 (12): : 778 - 785