Fixed Beam Moving Stage Electron Beam Lithography of Waveguide Coupling Device Structures

被引:0
|
作者
Sanabia, Jason E. [1 ]
Burcham, Kevin E. [1 ]
Klingfus, Joseph [1 ]
Piaszenski, Guido [2 ]
Kahl, Michael [2 ]
Jede, Ralf [2 ]
机构
[1] Raith USA Inc, 2805 Vet Highway,Suite 23, Ronkonkoma, NY 11779 USA
[2] Raith GmbH, D-44263 Dortmund, Germany
来源
2012 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) | 2012年
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The Fixed Beam Moving Stage (FBMS) lithography mode is used toward the fabrication of waveguide coupling device structures. Scanning electron microscope metrology is used for the dimensional characterization of the resulting waveguide structures.
引用
收藏
页数:2
相关论文
共 50 条
  • [21] Nanometer Electron Beam lithography
    Ochiai, Yukinori
    Manako, Shoko
    Fujita, Jun-Ichi
    Nomura, Eiichi
    NEC Research and Development, 1999, 40 (04): : 388 - 392
  • [22] Nanometer electron beam lithography
    Ochiai, Y
    Manako, S
    Fujita, J
    Nomura, E
    NEC RESEARCH & DEVELOPMENT, 1999, 40 (04): : 388 - 392
  • [23] ELECTRON-BEAM LITHOGRAPHY
    HERRIOTT, DR
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (03) : C102 - C102
  • [24] ELECTRON-BEAM LITHOGRAPHY
    PEASE, RFW
    CONTEMPORARY PHYSICS, 1981, 22 (03) : 265 - 290
  • [25] Electron-beam lithography
    Harriott, L
    Liddle, A
    PHYSICS WORLD, 1997, 10 (04) : 41 - 45
  • [26] Fabrication of high density waveguide structures using e-beam lithography
    Kasture, Sachin
    Nikesh, V. V.
    Mulay, Gajendra
    Gopal, Achanta Venu
    2012 INTERNATIONAL CONFERENCE ON FIBER OPTICS AND PHOTONICS (PHOTONICS), 2012,
  • [27] Electron beam lithography and its application in fabricating nano-device
    Lin, M
    Qiu, YL
    Chen, BQ
    Xiu, QX
    Zheng, YK
    2004: 7TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUITS TECHNOLOGY, VOLS 1- 3, PROCEEDINGS, 2004, : 563 - 566
  • [28] Fabrication of low loss, waveguide grating filters using electron beam lithography
    Millar, P
    Harkins, R
    Aitchison, JS
    ELECTRONICS LETTERS, 1997, 33 (12) : 1031 - 1032
  • [29] Mediated coupling of surface plasmon polaritons by a moving electron beam
    Gong, Sen
    Hu, Min
    Zhong, Renbin
    Zhao, Tao
    Zhang, Chao
    Liu, Shenggang
    OPTICS EXPRESS, 2017, 25 (21): : 25919 - 25928
  • [30] Modeling of electron beam deflection from charging in electron beam lithography
    Hwu, JJ
    Ko, Y
    Joy, DC
    MICROBEAM ANALYSIS 2000, PROCEEDINGS, 2000, (165): : 479 - 480