Fixed Beam Moving Stage Electron Beam Lithography of Waveguide Coupling Device Structures

被引:0
|
作者
Sanabia, Jason E. [1 ]
Burcham, Kevin E. [1 ]
Klingfus, Joseph [1 ]
Piaszenski, Guido [2 ]
Kahl, Michael [2 ]
Jede, Ralf [2 ]
机构
[1] Raith USA Inc, 2805 Vet Highway,Suite 23, Ronkonkoma, NY 11779 USA
[2] Raith GmbH, D-44263 Dortmund, Germany
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The Fixed Beam Moving Stage (FBMS) lithography mode is used toward the fabrication of waveguide coupling device structures. Scanning electron microscope metrology is used for the dimensional characterization of the resulting waveguide structures.
引用
收藏
页数:2
相关论文
共 50 条
  • [1] Electron beam lithography using fixed beam moving stage
    Khodadad, Iman
    Nelson-Fitzpatrick, Nathan
    Burcham, Kevin
    Hajian, Arsen
    Saini, Simarjeet S.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2017, 35 (05):
  • [2] Method to fabricate taper waveguide using fixed-beam moving stage electron-beam lithography
    Mere, Viphretuo
    Selvaraja, Shankar Kumar
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2019, 18 (04):
  • [3] Fabrication of Terahertz coupling structures by electron beam lithography
    Rosolen, Grahame
    PIERS 2008 HANGZHOU: PROGRESS IN ELECTROMAGNETICS RESEARCH SYMPOSIUM, VOLS I AND II, PROCEEDINGS, 2008, : 405 - 408
  • [4] Demonstration of alignment error-free patterning of tapered waveguide using Fixed Beam Moving Stage e-beam lithography
    Mere, Viphretuo
    Selvaraja, Shankar Kumar
    ADVANCED FABRICATION TECHNOLOGIES FOR MICRO/NANO OPTICS AND PHOTONICS XII, 2019, 10930
  • [5] ELECTRON-BEAM LITHOGRAPHY IN TELECOMMUNICATIONS DEVICE FABRICATION .1. ELECTRON-BEAM LITHOGRAPHY MACHINES
    JONES, ME
    DIX, C
    BRITISH TELECOM TECHNOLOGY JOURNAL, 1989, 7 (01): : 25 - 43
  • [6] Suspended structures made by electron beam lithography
    Lutwyche, M.I.
    Moore, D.F.
    Journal of Micromechanics and Microengineering, 1991, 1 (04): : 237 - 246
  • [7] Segmented waveguide array gratings made by electron beam lithography
    Grondin, Etienne
    Genest, Jonathan
    Duguay, Michel A.
    Beauvais, Jacques
    Aimez, Vincent
    PHOTONICS NORTH 2006, PTS 1 AND 2, 2006, 6343
  • [8] Submicron structures in thin layers by electron beam lithography and ion beam sputtering
    Cherif, SM
    Hennequin, JF
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1997, 165 (1-3) : 504 - 507
  • [9] Electron Beam Lithography Fabrication of Superconducting Tunnel Structures
    M. Yu. Fominskii
    L. V. Filippenko
    A. M. Chekushkin
    V. P. Koshelets
    Physics of the Solid State, 2021, 63 : 1351 - 1355
  • [10] Fabrication of photonic crystal structures by electron beam lithography
    Rosolen, Grahame
    Cola, Adriano
    2006 CONFERENCE ON OPTOELECTRONIC AND MICROELECTRONIC MATERIALS & DEVICES, 2006, : 66 - 68