High performance CMOS variability in the 65nm regime and beyond

被引：74
|
作者：
Nassif, Sani
Bernstein, Kerry
Frank, David J.
Gattiker, Anne
Haensch, Wilfried
Ji, Brian L.
Nowak, Ed
Pearson, Dale
Rohrer, Norman J.
机构：
来源：
2007 IEEE INTERNATIONAL ELECTRON DEVICES MEETING, VOLS 1 AND 2 | 2007年
关键词：
D O I：
10.1109/IEDM.2007.4419002
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：569 / 571
页数：3
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