Electrical Characteristics of Ba0.6Sr0.4TiO3 Thin-Film Chip Capacitors for Embedded Passive Components
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作者:
Rahayu, Rheza
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Korea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Univ Sci & Technol, Taejon 305350, South KoreaKorea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Rahayu, Rheza
[1
,2
]
Kang, Min-Gyu
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Korea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South KoreaKorea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Kang, Min-Gyu
[1
]
Do, Young-Ho
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Korea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South KoreaKorea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Do, Young-Ho
[1
]
Hwang, Jin-Ha
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Hongik Univ, Dept Mat Sci & Engn, Seoul 121791, South KoreaKorea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Hwang, Jin-Ha
[3
]
Kang, Chong-Yun
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Korea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Korea Univ, KU KIST Sch, IT NS, Seoul 136701, South KoreaKorea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Kang, Chong-Yun
[1
,4
]
Yoon, Seok-Jin
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机构:Korea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Yoon, Seok-Jin
机构:
[1] Korea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
[2] Univ Sci & Technol, Taejon 305350, South Korea
[3] Hongik Univ, Dept Mat Sci & Engn, Seoul 121791, South Korea
[4] Korea Univ, KU KIST Sch, IT NS, Seoul 136701, South Korea
The single-layer 400 mu m x 200 mu m sized Ba0.6Sr0.4TiO3 thin-film embedded chip capacitors with two external electrodes fabricated on the surface of the chip capacitors have been demonstrated. The structure of the external electrodes placed on the same surface allows the reduction of connection length, resulting in low parasitic loss and noise of elecronic devices. The fabricated chip capacitors exhibited excellent electrical properties such as high capacitance density and dielectric constant (1687 nF/cm(2) and 452) and a low dielectric loss of 0.052 at 1 kHz, respectively. In addition, the chip capacitors exhibited the superior temperature stability of X5R (Delta C/C = +/- 15% at -55 degrees C to +85 degrees C) characteristics. Such a low leakage current density of similar to 0.15 mu A/cm(2) at 3 V and a high breakdown voltage of 19.75 V were obtained as well. In conclusion, the chip capacitors are suggested as a candidate for the applications of embedded passive components.
机构:
Chongqing Univ Sci & Technol, Sch Met & Mat Engn, Chongqing 400050, Peoples R China
Chongqing Univ, Sch Mat Sci & Engn, Chongqing 400044, Peoples R ChinaChongqing Univ Sci & Technol, Sch Met & Mat Engn, Chongqing 400050, Peoples R China
Fu, Chunlin
Cai, Wei
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Chongqing Univ Sci & Technol, Sch Met & Mat Engn, Chongqing 400050, Peoples R ChinaChongqing Univ Sci & Technol, Sch Met & Mat Engn, Chongqing 400050, Peoples R China
Cai, Wei
Chen, Hongwei
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机构:
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R ChinaChongqing Univ Sci & Technol, Sch Met & Mat Engn, Chongqing 400050, Peoples R China
Chen, Hongwei
Feng, Shucheng
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Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R ChinaChongqing Univ Sci & Technol, Sch Met & Mat Engn, Chongqing 400050, Peoples R China
Feng, Shucheng
Pan, Fusheng
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机构:
Chongqing Univ, Sch Mat Sci & Engn, Chongqing 400044, Peoples R ChinaChongqing Univ Sci & Technol, Sch Met & Mat Engn, Chongqing 400050, Peoples R China
Pan, Fusheng
Yang, Chuanren
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机构:
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R ChinaChongqing Univ Sci & Technol, Sch Met & Mat Engn, Chongqing 400050, Peoples R China
机构:
R & D Technol Ctr, HI Cap Dept, Yageo Corp Nantze Branch, Kaohsiung 811, TaiwanR & D Technol Ctr, HI Cap Dept, Yageo Corp Nantze Branch, Kaohsiung 811, Taiwan
Chiu, Ming-Chieh
Yao, Hsiao-Chiang
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机构:R & D Technol Ctr, HI Cap Dept, Yageo Corp Nantze Branch, Kaohsiung 811, Taiwan
Yao, Hsiao-Chiang
Yao, Hsiao-Chiang
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机构:R & D Technol Ctr, HI Cap Dept, Yageo Corp Nantze Branch, Kaohsiung 811, Taiwan
Yao, Hsiao-Chiang
Huang, Chueh-Jung
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机构:R & D Technol Ctr, HI Cap Dept, Yageo Corp Nantze Branch, Kaohsiung 811, Taiwan
Huang, Chueh-Jung
Shieu, Fuh-Sheng
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机构:R & D Technol Ctr, HI Cap Dept, Yageo Corp Nantze Branch, Kaohsiung 811, Taiwan