Electrical Characteristics of Ba0.6Sr0.4TiO3 Thin-Film Chip Capacitors for Embedded Passive Components
被引:9
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作者:
Rahayu, Rheza
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Korea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Univ Sci & Technol, Taejon 305350, South KoreaKorea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Rahayu, Rheza
[1
,2
]
Kang, Min-Gyu
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Korea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South KoreaKorea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Kang, Min-Gyu
[1
]
Do, Young-Ho
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Korea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South KoreaKorea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Do, Young-Ho
[1
]
Hwang, Jin-Ha
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机构:
Hongik Univ, Dept Mat Sci & Engn, Seoul 121791, South KoreaKorea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Hwang, Jin-Ha
[3
]
Kang, Chong-Yun
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Korea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Korea Univ, KU KIST Sch, IT NS, Seoul 136701, South KoreaKorea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Kang, Chong-Yun
[1
,4
]
Yoon, Seok-Jin
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机构:Korea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
Yoon, Seok-Jin
机构:
[1] Korea Inst Sci & Technol, Elect Mat Res Ctr, Future Convergence Res Div, Seoul 136791, South Korea
[2] Univ Sci & Technol, Taejon 305350, South Korea
[3] Hongik Univ, Dept Mat Sci & Engn, Seoul 121791, South Korea
[4] Korea Univ, KU KIST Sch, IT NS, Seoul 136701, South Korea
The single-layer 400 mu m x 200 mu m sized Ba0.6Sr0.4TiO3 thin-film embedded chip capacitors with two external electrodes fabricated on the surface of the chip capacitors have been demonstrated. The structure of the external electrodes placed on the same surface allows the reduction of connection length, resulting in low parasitic loss and noise of elecronic devices. The fabricated chip capacitors exhibited excellent electrical properties such as high capacitance density and dielectric constant (1687 nF/cm(2) and 452) and a low dielectric loss of 0.052 at 1 kHz, respectively. In addition, the chip capacitors exhibited the superior temperature stability of X5R (Delta C/C = +/- 15% at -55 degrees C to +85 degrees C) characteristics. Such a low leakage current density of similar to 0.15 mu A/cm(2) at 3 V and a high breakdown voltage of 19.75 V were obtained as well. In conclusion, the chip capacitors are suggested as a candidate for the applications of embedded passive components.
机构:
Tsing Hua Univ, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R ChinaTsing Hua Univ, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China
Wang Xili
Xue Hao
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Tsing Hua Univ, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R ChinaTsing Hua Univ, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China
Xue Hao
Zhou Heping
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Tsing Hua Univ, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R ChinaTsing Hua Univ, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China
机构:
Univ Malaysia Perlis, Sch Microelect Engn, Kuala Perlis 02000, Perlis, MalaysiaUniv Malaysia Perlis, Sch Microelect Engn, Kuala Perlis 02000, Perlis, Malaysia
Saif, Ala'eddin A.
Poopalan, P.
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Univ Malaysia Perlis, Sch Microelect Engn, Kuala Perlis 02000, Perlis, MalaysiaUniv Malaysia Perlis, Sch Microelect Engn, Kuala Perlis 02000, Perlis, Malaysia
机构:
Hong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R ChinaHong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R China
Wang, DY
Wang, Y
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R China
Wang, Y
Wong, KH
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R China
Wong, KH
Lor, KP
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R China
Lor, KP
Chan, HP
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R China
Chan, HP
Chiang, KS
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R China
Chiang, KS
Chan, HLW
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R China
Chan, HLW
Choy, CL
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R China