共 50 条
- [41] SiO2 etching using M = 0 helicon wave plasma Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1996, 35 (4 B): : 2477 - 2482
- [42] SiO2 etching using M=0 helicon wave plasma JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (4B): : 2477 - 2482
- [43] Peculiarities of the helicon mode propagation with m < 0 in radially nonuniform plasma cylinder Bulletin of the Lebedev Physics Institute, 2008, 35 : 211 - 213
- [45] Characterisation of density linear control in a helicon plasma source with tunable antenna wavenumber spectra PLASMA SOURCES SCIENCE & TECHNOLOGY, 2021, 30 (07):
- [48] Compact high-density plasma source produced by using standing helicon waves JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1999, 38 (7A): : L777 - L779