SiO2 etching using M = 0 helicon wave plasma

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作者
Nogami, Hiroshi [1 ]
Nakagawa, Yukito [1 ]
Mashimo, Kimiko [1 ]
Ogahara, Yoneichi [1 ]
Tsukada, Tsutomu [1 ]
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[1] Nelva Corp, Tokyo, Japan
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页码:2477 / 2482
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