Characterization of Flicker Noise in Dual Material Gate Silicon Nanowire Transistors

被引:0
|
作者
Anandan, P. [1 ]
Saranya, V. [1 ]
Mohankumar, N. [1 ]
机构
[1] SKP Engn Coll, Tiruvannamalai 606611, Tamil Nadu, India
关键词
Silicon Nanowire Transistor; Flicker Noise; Power Spectral Density; Dual Material Gate; SOI MOSFET;
D O I
10.1166/jno.2017.1829
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper the effect of flicker noise on the performance of Dual Material Gate Silicon Nanowire Transistor is investigated. Gate engineering in the Silicon Nanowire Transistor have a strong impact on Flicker noise. The spectral density of flicker noise for Dual Material Gate Silicon Nanowire Transistor as a function of various parameters like gate to source voltage, frequency, drain current, drain to source voltage, and different gate length for different drain voltages is observed. The simulation results of Dual Material Gate Silicon Nanowire Transistor are compared with single gate Silicon Nanowire Transistors for improved performance.
引用
收藏
页码:72 / 75
页数:4
相关论文
共 50 条
  • [41] Gate coupling and carrier distribution in silicon nanowire/nanoribbon transistors operated in electrolyte
    Chen, Si
    Zhang, Shi-Li
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2011, 29 (01):
  • [42] Enhanced channel modulation in dual-gated silicon nanowire transistors
    Koo, SM
    Li, QL
    Edelstein, MD
    Richter, CA
    Vogel, EM
    NANO LETTERS, 2005, 5 (12) : 2519 - 2523
  • [43] Polarity-Controllable Silicon Nanowire Transistors With Dual Threshold Voltages
    Zhang, Jian
    De Marchi, Michele
    Sacchetto, Davide
    Gaillardon, Pierre-Emmanuel
    Leblebici, Yusuf
    De Micheli, Giovanni
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2014, 61 (11) : 3654 - 3660
  • [44] Random telegraph signal noise in gate-all-around silicon nanowire transistors featuring Coulomb-blockade characteristics
    Zhuge, Jing
    Zhang, Liangliang
    Wang, Runsheng
    Huang, Ru
    Kim, Dong-Won
    Park, Donggun
    Wang, Yangyuan
    APPLIED PHYSICS LETTERS, 2009, 94 (08)
  • [45] Characterization of low-frequency noise in GaAs nanowire field-effect transistors controlled by Schottky wrap gate
    Graduate School of Information Science and Technology, Research Center for Integrated Quantum Electronics, Hokkaido University, Sapporo 060-0814, Japan
    不详
    Jpn. J. Appl. Phys., 6 PART 2
  • [46] Characterization of Low-Frequency Noise in GaAs Nanowire Field-Effect Transistors Controlled by Schottky Wrap Gate
    Miura, Kensuke
    Shiratori, Yuta
    Kasai, Seiya
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (06)
  • [47] Role of Self-Assembled Monolayer Passivation in Electrical Transport Properties and Flicker Noise of Nanowire Transistors
    Kim, Seongmin
    Carpenter, Patrick D.
    Jean, Rand K.
    Chen, Haitian
    Zhou, Chongwu
    Ju, Sanghyun
    Janes, David B.
    ACS NANO, 2012, 6 (08) : 7352 - 7361
  • [48] Multimode Silicon Nanowire Transistors
    Glassner, Sebastian
    Zeiner, Clemens
    Periwal, Priyanka
    Baron, Thierry
    Bertagnolli, Emmerich
    Lugstein, Alois
    NANO LETTERS, 2014, 14 (11) : 6699 - 6703
  • [49] Reconfigurable Silicon Nanowire Transistors
    Heinzig, Andre
    Slesazeck, Stefan
    Kreupl, Franz
    Mikolajick, Thomas
    Weber, Walter M.
    NANO LETTERS, 2012, 12 (01) : 119 - 124
  • [50] Current and Noise Properties of InAs Nanowire Transistors With Asymmetric Contacts Induced by Gate Overlap
    Delker, Collin J.
    Zi, Yunlong
    Yang, Chen
    Janes, David B.
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2014, 61 (03) : 884 - 889