Boltzmann Analysis of Electron Swarm Parameters in Binary CF4 + Ar Mixtures

被引:10
|
作者
Tezcan, S. S. [1 ]
Dincer, M. S. [1 ]
Bektas, S. [2 ]
Hiziroglu, H. R. [3 ]
机构
[1] Gazi Univ, Dept Elect & Elect Engn, TR-06570 Ankara, Turkey
[2] Near East Univ, Dept Elect & Elect Engn, Nicosia, Cyprus
[3] Kettering Univ Flint, Dept Elect & Comp Engn, Flint, MI 48504 USA
关键词
Gas discharges; CF4; argon; electron swarm parameters; CROSS-SECTIONS; TRANSPORT-COEFFICIENTS; DRIFT VELOCITIES; GAS-MIXTURES; IONIZATION; ARGON; SCATTERING; ATTACHMENT; SF6;
D O I
10.1109/TDEI.2013.6451346
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The electron swarm parameters, namely electron mean energy, drift velocity, effective ionization coefficient and limiting values of number density reduced electric fields, E/N, are calculated in CF4+Ar mixtures for various CF4 concentrations that vary from 2 to 100% over a range of E/N from 50Td to 600Td by solving Boltzmann's equation. In this study Boltzmann's equation was solved using finite difference method under steady-state Townsend condition. One of the most important results of this study indicated that at higher E/N values inelastic processes due to argon began to control the swarm energy thus leading this binary mixture act essentially like pure argon.
引用
收藏
页码:98 / 103
页数:6
相关论文
共 50 条
  • [41] Monte Carlo Simulation of Electron Swarms Parameters in c-C4F8/CF4 Gas Mixtures
    刘雪丽
    肖登明
    王延安
    张周胜
    Journal of Shanghai Jiaotong University(Science), 2008, (04) : 443 - 447
  • [42] Effective ionization coefficients, limiting electric fields, and electron energy distributions in CF3I + CF4 + Ar ternary gas mixtures
    Tezcan, S. S.
    Dincer, M. S.
    Bektas, S.
    PHYSICS OF PLASMAS, 2016, 23 (07)
  • [43] Ion beam etching of CVD diamond film in Ar, Ar/O2 and Ar/CF4 gas mixtures
    Leech, PW
    Reeves, GK
    Holland, AS
    Shanks, F
    DIAMOND AND RELATED MATERIALS, 2002, 11 (3-6) : 833 - 836
  • [44] Transport coefficients for electron scattering in CF4/Ar/O2 mixtures with a significant presence of Fx or CFx radicals
    Nikitovic, Z.
    Stojanovic, V.
    Petrovic, Z. Lj
    Cvelbar, U.
    Mozetic, M.
    EPL, 2010, 91 (05)
  • [45] Cross Section Sets and Transport Parameters for Ar+ Ions in Cf4 Gas
    Nikitović, Željka
    Raspopović, Zoran
    Science of Sintering, 2024, 56 (02) : 223 - 230
  • [46] Enhancement of etch rate by the addition of O2 and Ar in chemical dry etching of Si using a discharge flow of Ar/CF4 and CF4/O4 gas mixtures
    Tsuji, M.
    Okano, S.
    Tanaka, A.
    Nishimura, Y.
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2001, 40 (4 A): : 2440 - 2446
  • [47] ELECTRON AND PHOTON EXCITATION OF CF4
    BROWN, WA
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1973, 18 (05): : 810 - 810
  • [48] Transport Coefficients For Electrons in Mixtures CF4/Ar/O2 and CF, CF2 or CF3 Radicals
    Nikitovic, Z.
    Stojanovic, V.
    Radmilovic-Radjenovic, M.
    ACTA PHYSICA POLONICA A, 2011, 120 (02) : 289 - 291
  • [49] Measurements of the electron energy distribution function in an Ar/CF4 inductively coupled plasma
    Bowden, MD
    Tabata, R
    Suanpoot, P
    Uchino, K
    Muraoka, K
    Noguchi, M
    JOURNAL OF APPLIED PHYSICS, 2001, 90 (05) : 2158 - 2161
  • [50] Pressure dependence of secondary NIR scintillation in Ar and Ar/CF4
    Fraga, MMR
    Bueno, CC
    Gonçalves, JAC
    Fraga, FAF
    Marques, RF
    Policarpo, AJPL
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2001, 48 (03) : 330 - 335