Boltzmann Analysis of Electron Swarm Parameters in Binary CF4 + Ar Mixtures

被引:10
|
作者
Tezcan, S. S. [1 ]
Dincer, M. S. [1 ]
Bektas, S. [2 ]
Hiziroglu, H. R. [3 ]
机构
[1] Gazi Univ, Dept Elect & Elect Engn, TR-06570 Ankara, Turkey
[2] Near East Univ, Dept Elect & Elect Engn, Nicosia, Cyprus
[3] Kettering Univ Flint, Dept Elect & Comp Engn, Flint, MI 48504 USA
关键词
Gas discharges; CF4; argon; electron swarm parameters; CROSS-SECTIONS; TRANSPORT-COEFFICIENTS; DRIFT VELOCITIES; GAS-MIXTURES; IONIZATION; ARGON; SCATTERING; ATTACHMENT; SF6;
D O I
10.1109/TDEI.2013.6451346
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The electron swarm parameters, namely electron mean energy, drift velocity, effective ionization coefficient and limiting values of number density reduced electric fields, E/N, are calculated in CF4+Ar mixtures for various CF4 concentrations that vary from 2 to 100% over a range of E/N from 50Td to 600Td by solving Boltzmann's equation. In this study Boltzmann's equation was solved using finite difference method under steady-state Townsend condition. One of the most important results of this study indicated that at higher E/N values inelastic processes due to argon began to control the swarm energy thus leading this binary mixture act essentially like pure argon.
引用
收藏
页码:98 / 103
页数:6
相关论文
共 50 条
  • [31] Determination of Electron Swarm Parameters in Pure CHF3 and CF4 by a Time-Resolved Method
    肖登明
    邓云坤
    Plasma Science and Technology, 2013, 15 (01) : 25 - 29
  • [32] A study of Ar + C2H4 and Xe + CF4 gas mixtures
    B. M. Ovchinnikov
    V. V. Parusov
    Instruments and Experimental Techniques, 2013, 56 : 637 - 639
  • [33] Parameters and Composition of Plasma in a CF4 + H2 + Ar Mixture: Effect of CF4/H2 Ratio
    Miakonkikh A.V.
    Kuzmenko V.O.
    Efremov A.M.
    Rudenko K.V.
    Russian Microelectronics, 2024, 53 (01) : 70 - 78
  • [34] A study of Ar + C2H4 and Xe + CF4 gas mixtures
    Ovchinnikov, B. M.
    Parusov, V. V.
    INSTRUMENTS AND EXPERIMENTAL TECHNIQUES, 2013, 56 (06) : 637 - 639
  • [35] Parameters of Plasma and Kinetics of Active Particles in CF4 (CHF3) + Ar Mixtures of a Variable Initial Composition
    Efremov A.M.
    Murin D.B.
    Kwon K.-H.
    Russ. Microelectr., 6 (371-380): : 371 - 380
  • [36] CF AND CF2 ACTINOMETRY IN A CF4/AR PLASMA
    KISS, LDB
    NICOLAI, JP
    CONNER, WT
    SAWIN, HH
    JOURNAL OF APPLIED PHYSICS, 1992, 71 (07) : 3186 - 3192
  • [37] Gas multiplication process in mixtures based on Ar, CO2, CF4
    Deptuch, M.
    Kowalski, T. Z.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2007, 572 (01): : 184 - 186
  • [38] Surface Analysis of AlGaN Treated with CF4 and Ar Plasma Etching
    Hirai, Shohdai
    Niibe, Masahito
    Kawakami, Retsuo
    Shirahama, Tatsuo
    Nakano, Yoshitaka
    Mukai, Takashi
    E-JOURNAL OF SURFACE SCIENCE AND NANOTECHNOLOGY, 2015, 13 : 481 - 487
  • [39] PLASMA PARAMETERS AND COMPOSITION IN CF4
    Efremov, A. M.
    Sobolev, A. M.
    Betelin, V. B.
    Kwon, K-H
    IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII KHIMIYA I KHIMICHESKAYA TEKHNOLOGIYA, 2019, 62 (12): : 108 - 118
  • [40] Monte carlo simulation of electron swarms parameters in c-C4F8/CF4 gas mixtures
    Liu X.-L.
    Xiao D.-M.
    Wang Y.-A.
    Zhang Z.-S.
    Journal of Shanghai Jiaotong University (Science), 2008, 13 E (04) : 443 - 447