Synthesis and characterization of phosphorus-doped ZnO and (Zn,Mg)O thin films via pulsed laser deposition

被引:2
|
作者
Li, YJ [1 ]
Heo, YW [1 ]
Erie, JM [1 ]
Kim, H [1 ]
Ip, K [1 ]
Pearton, SJ [1 ]
Norton, DP [1 ]
机构
[1] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
关键词
wide bandgap semiconductor; zinc oxide; (Zn; Mg)O; phosphorus doped; pulsed laser deposition;
D O I
10.1007/s11664-006-0095-z
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The transport and optical properties of phosphorus-doped (Zn,Mg)O thin films grown via pulsed laser deposition (PLD) are studied. The carrier type of as-deposited (Zn,Mg)O:P films converts from n-type to p-type with increasing oxygen partial pressure. All the films exhibit good crystallinity with c-axis orientation. This result indicates the importance of oxidation conditions in realizing p-type (Zn,Mg)O:P films. The as-deposited ZnO:P film properties show a strong dependence on the deposition ambient at different growth temperatures. The resistivity of the samples deposited in O-3/O-2 mixture is two orders of magnitude higher than the films grown in oxygen and O-2/Ar/H-2 mixture. The room-temperature photoluminescence (PL) of the as-deposited films has been shown that growing in the O-2/Ar/H-2 mixture ambient significantly increases the band edge emission while inhibiting the visible emission. The enhanced ultraviolet (UV) emission in the films grown in O-2/Ar/H-2 mixture may result from hydrogen passivation of the deep level emission centers. The annealed ZnO:P films are n-type with nonlinear dependence of resistivity on annealing temperature. The resistivity increases in the films with annealing at 800 degrees C while decreasing with further increasing annealing temperature. Strong visible light emission is observed from the ZnO:P films annealed in oxygen.
引用
收藏
页码:530 / 537
页数:8
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