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Inductively coupled plasma heating in a weakly magnetized plasma
被引:34
|作者:
Kim, SS
[1
]
Chang, CS
Yoon, NS
Whang, KW
机构:
[1] Korea Adv Inst Sci & Technol, Dept Phys, Taejon 305701, South Korea
[2] Seoul Natl Univ, Dept Elect Engn, Seoul 151742, South Korea
关键词:
D O I:
10.1063/1.873250
中图分类号:
O35 [流体力学];
O53 [等离子体物理学];
学科分类号:
070204 ;
080103 ;
080704 ;
摘要:
A one-dimensional analysis of electron heating process in a weakly magnetized, inductively coupled plasma (MICP) is presented. It is found that the main difference in the heating process of a MICP from that of a usual unmagnetized ICP is in that circularly polarized wave modes can exist in the plasma. The right handed circularly polarized wave (R-wave) can propagate into the plasma and its amplitude can be enhanced by cavity resonance effect at an appropriate chamber length and external magnetic field strength. The enhanced R-wave amplitude can raise the heating efficiency significantly. It is also found that a bounce cyclotron-resonance effect can exist, which, however, is not as significant as the cavity resonance effect. (C) 1999 American Institute of Physics. [S1070-664X(99)01607-9].
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页码:2926 / 2935
页数:10
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