Inductively coupled plasma heating in a weakly magnetized plasma

被引:36
|
作者
Kim, SS [1 ]
Chang, CS
Yoon, NS
Whang, KW
机构
[1] Korea Adv Inst Sci & Technol, Dept Phys, Taejon 305701, South Korea
[2] Seoul Natl Univ, Dept Elect Engn, Seoul 151742, South Korea
关键词
D O I
10.1063/1.873250
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A one-dimensional analysis of electron heating process in a weakly magnetized, inductively coupled plasma (MICP) is presented. It is found that the main difference in the heating process of a MICP from that of a usual unmagnetized ICP is in that circularly polarized wave modes can exist in the plasma. The right handed circularly polarized wave (R-wave) can propagate into the plasma and its amplitude can be enhanced by cavity resonance effect at an appropriate chamber length and external magnetic field strength. The enhanced R-wave amplitude can raise the heating efficiency significantly. It is also found that a bounce cyclotron-resonance effect can exist, which, however, is not as significant as the cavity resonance effect. (C) 1999 American Institute of Physics. [S1070-664X(99)01607-9].
引用
收藏
页码:2926 / 2935
页数:10
相关论文
共 50 条
  • [21] Characteristics of silicon carbide etching using magnetized inductively coupled plasma
    Lee, H.Y., 1600, Japan Society of Applied Physics (44):
  • [22] Characteristics of silicon carbide etching using magnetized inductively coupled plasma
    Lee, HY
    Kim, DW
    Sung, YJ
    Yeom, GY
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (03): : 1445 - 1449
  • [23] Study of radiation damage and contamination by magnetized inductively coupled plasma etching
    Kim, HS
    Nam, WJ
    Yeom, GY
    Lee, HJ
    Kim, JH
    Whang, KW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1996, 14 (03): : 1062 - 1066
  • [24] Model for noncollisional heating in inductively coupled plasma processing sources
    Rauf, S
    Kushner, MJ
    JOURNAL OF APPLIED PHYSICS, 1997, 81 (09) : 5966 - 5974
  • [25] Simulation of droplet heating and desolvation in inductively coupled plasma - part II: coalescence in the plasma
    Benson, CM
    Zhong, JQ
    Gimelshein, SF
    Levin, DA
    Montaser, A
    SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 2003, 58 (08) : 1453 - 1471
  • [26] Beam formation in a weakly collisional expanding, inductively coupled plasma.
    Fredriksen, A.
    Gulbrandsen, N.
    2014 XXXITH URSI GENERAL ASSEMBLY AND SCIENTIFIC SYMPOSIUM (URSI GASS), 2014,
  • [27] Effects of assistant anode on planar inductively coupled magnetized argon plasma in plasma immersion ion implantation
    Tang, D
    Chu, PK
    JOURNAL OF APPLIED PHYSICS, 2003, 93 (10) : 5883 - 5887
  • [28] Transition of electron kinetics in weakly magnetized inductively coupled plasmas
    Kim, Jin-Yong
    Lee, Hyo-Chang
    Kim, Young-Do
    Kim, Young-Cheol
    Chung, Chin-Wook
    PHYSICS OF PLASMAS, 2013, 20 (10)
  • [29] Deep learning-assisted magnetized inductively coupled plasma discharge modeling
    Zhao, Yang
    Chen, Wenyi
    Miao, Zongcheng
    Yang, Pengfei
    Zhou, Xiaohua
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2024, 33 (12):
  • [30] Reduced electron temperature in a magnetized inductively-coupled plasma with internal coil
    Monreal, J. Arancibia
    Chabert, P.
    Godyak, V.
    PHYSICS OF PLASMAS, 2013, 20 (10)