A power supply for magnetron sputtering systems

被引：6
|
作者：
Sochugov, N. S. [1 ]
Oskirko, V. O. [1 ]
Spirin, R. E. [1 ]
机构：
[1] Russian Acad Sci, Inst High Current Elect, Siberian Branch, Tomsk 634055, Russia
来源：
INSTRUMENTS AND EXPERIMENTAL TECHNIQUES | 2013年 / 56卷 / 02期
关键词：
FILMS;
D O I：
10.1134/S0020441213010302
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A design and electric circuits of the power supply for magnetron sputtering systems with a power of up to 5 kW are described. The power supply is intended for operation in direct-current (DC) or pulse modes with a pulse repetition rate of up to 100 kHz. The arc suppression system limits the energy delivered to the arc discharge at about 110 mJ in the DC mode and 9 mJ in the pulse mode, respectively. The possibilities of optimizing coatings by selecting working parameters of the power supply were demonstrated by the example of thin-film coatings of two types (Ag and Ga-doped ZnO thin films).
引用
收藏
页码：178 / 184
页数：7
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